Probe Array Base, Method for Manufacturing Probe Array Base, Method for Manufacturing Probe Array

Abstract

A probe array base including probe-holding portions which are periodically arranged on a solid base member and which have grooves is prepared by anisotropically etching a single-crystalline silicon substrate. Probe solutions are supplied to the probe-holding portions by capillary action from a plurality of tank arrays having a certain cylinder period. This allows a probe array to be completed. The probe array is used as, for example, a DNA or antigen chip, has a high degree of integration, and is capable of holding a constant and sufficient number of probe molecules.

1 . A probe array base comprising:
 a base member having a principal surface; and   probe-holding portions arranged on the principal surface of the base member in a projecting manner,   wherein the probe-holding portions have grooves.   
     
     
         2 . The probe array base according to  claim 1 , wherein the probe-holding portions project substantially perpendicularly from the principal surface of the base member and the grooves extend substantially in parallel to the direction in which the probe-holding portions project. 
     
     
         3 . The probe array base according to  claim 2 , wherein 1 μm≦W≦100 μm and D≧2W hold, where W represents a width of the grooves in the probe-holding portions and D represents a length that the probes-holding portions project from the principal surface of the base member. 
     
     
         4 . The probe array base according to  claim 1 , wherein the base member and the probe-holding portions are integral. 
     
     
         5 . The probe array base according to  claim 1 , wherein the base member and the probe-holding portions are made of single-crystalline silicon, the principal surface of the base member is oriented in the [110] plane, and the probe-holding portions have surfaces which are connected to the principal surface of the base member and which are oriented in the [111] plane. 
     
     
         6 . A probe array comprising the probe array base according to  claim 1 , wherein the probe-holding portions are supplied with a probe solution by capillary action. 
     
     
         7 . A method for manufacturing a probe array including the probe array base according to  claim 1 , the method comprising supplying a probe solution to the probe-holding portions by capillary action. 
     
     
         8 . A method for manufacturing the probe array base according to  claim 5 , comprising:
 forming an oxide film on a single-crystalline silicon substrate;   patterning the oxide film;   etching the single-crystalline silicon substrate with an alkali solution using the patterned oxide film as a mask; and   removing the oxide film.   
     
     
         9 . The method for manufacturing the probe array according to  claim 7 , wherein the probe solution is supplied to the probe-holding portions by capillary action through the use of a first to an nth probe solution tank array, where n is an integer of two or more, the method further comprising:
 a first procedure for supplying the probe solution to a first set of the probe-holding portions, the first set of probe-holding portions located at positions corresponding to a sequence of the first tank array; and   an ith procedure for supplying the probe solution to an ith set of the probe-holding portions which are unsupplied with the probe solution in any one of the first to (i−1)th procedures and which are located at positions corresponding to a sequence of the nth tank array,   where i is an integer of two to n, and   wherein the first and ith procedures are performed in the order of first to nth.   
     
     
         10 . A probe array base comprising:
 a base member having a principal surface; and   probe-holding portions which are arranged in the principal surface of the base member and which have pores,   wherein the probe-holding portions have partitions.   
     
     
         11 . The probe array base according to  claim 10 , wherein the partitions have parts disconnected from the walls of the pores. 
     
     
         12 . The probe array base according to  claim 10 , wherein the partitions project out from the principal surface of the base member. 
     
     
         13 . The probe array base according to  claim 11 , wherein the partitions project out from the principal surface of the base member. 
     
     
         14 . The probe array base according to  claim 10 , wherein the base member and the probe-holding portions are integral. 
     
     
         15 . The probe array base according to  claim 10 , wherein the base member and the probe-holding portions are made of single-crystalline silicon, the principal surface of the base member is oriented in the [110] plane, and the probe-holding portions have surfaces which are connected to the principal surface of the base member and which are oriented in the [111] plane. 
     
     
         16 . A probe array comprising the probe array base according to  claim 10 , wherein the probe-holding portions are supplied with a probe solution by capillary action. 
     
     
         17 . A method for manufacturing a probe array including the probe array base according to  claim 10 , the method comprising supplying a probe solution to the probe-holding portions by capillary action. 
     
     
         18 . A method for manufacturing the probe array base according to  claim 15 , comprising:
 forming an oxide film on a single-crystalline silicon substrate;   patterning the oxide film;   etching the single-crystalline silicon substrate with an alkali solution using the patterned oxide film as a mask; and   removing the oxide film.   
     
     
         19 . A method for manufacturing the probe array according to  claim 17 , wherein the probe solution is supplied to the probe-holding portions by capillary action through the use of a first to an nth probe solution tank arrays, where n is an integer of two or more, the method further comprising:
 a first procedure for supplying the probe solution to a first set of the probe-holding portions, the first set of probe-holding portions located at positions corresponding to the sequence of the first tank array; and   an ith procedure for supplying the probe solution to an ith set of the probe-holding portions which are unsupplied with the probe solution in any one of the first to (i−1)th procedures and which are located at positions corresponding to a sequence of the nth tank array,   where i is an integer of two to n, and   wherein the first through ith procedures are performed in the order of first to nth.