Transfer chamber with vacuum extension for shutter disks

Abstract

The present invention relates to a cluster tool for processing semiconductor substrates. One embodiment of the present invention provides a mainframe for a cluster tool comprising a transfer chamber having a substrate transferring robot disposed therein. The substrate transferring robot is configured to shuttle substrates among one or more processing chambers directly or indirectly connected to the transfer chamber. The mainframe further comprises a shutter disk shelf configured to store one or more shutter disks to be used by the one or more processing chambers, wherein the shutter disk shelf is accessible to the substrate transferring robot so that the substrate transferring robot can transfer the one or more shutter disks between the shutter disk shelf and the one or more processing chambers directly or indirectly connected to the transfer chamber.

1 . A mainframe for a cluster tool, comprising:
 a transfer chamber having a substrate transferring robot disposed therein, wherein the substrate transferring robot is configured to shuttle substrates among one or more processing chambers directly or indirectly connected to the transfer chamber; and   a shutter disk shelf configured to store one or more shutter disks to be used by the one or more processing chambers, wherein the shutter disk shelf is accessible to the substrate transferring robot so that the substrate transferring robot can transfer the one or more shutter disks between the shutter disk shelf and the one or more processing chambers directly or indirectly connected to the transfer chamber.   
   
   
       2 . The mainframe of  claim 1 , wherein the substrate transferring robot is configured to shuttle substrates in a range of motion extending beyond the location of the shutter disk shelf. 
   
   
       3 . The mainframe of  claim 1 , further comprising an extension chamber connected to the transfer chamber, wherein the shutter disk shelf is disposed in the extension chamber. 
   
   
       4 . The mainframe of  claim 3 , further comprising one of a load lock chamber or a pass through chamber connected to the extension chamber, wherein the load lock chamber or the pass through chamber is configured to connect the transfer chamber with a front end environment, and an inner volume of the extension chamber provides a robot passage between the load lock chamber or the pass through chamber and the transfer chamber for the substrate transferring robot. 
   
   
       5 . The mainframe of  claim 4 , wherein the shutter disk shelf is positioned in the inner volume of the extension chamber away from the robot passage. 
   
   
       6 . The mainframe of  claim 4 , wherein the shutter disk shelf is movably disposed in the inner volume of the extension chamber. 
   
   
       7 . The mainframe of  claim 6 , further comprising an indexer coupled to the shutter disk shelf, wherein the indexer is configured to move the shutter disk shelf vertically within the inner volume of the extension chamber. 
   
   
       8 . The mainframe of  claim 3 , wherein the transfer chamber and the extension chamber are in fluid communication, and a vacuum pump is adapted to a pressure modification port formed on a bottom wall of the extension chamber and configured to provide a low pressure environment to the transfer chamber. 
   
   
       9 . The mainframe of  claim 1 , wherein the shutter disk shelf comprises:
 a first post;   a second post disposed opposing the first post; and   one or more pairs supporting fingers extending from each of the first and second posts, wherein the one or more pairs of supporting fingers form one or more slots, and each slot is configured to support one shutter disk thereon.   
   
   
       10 . The mainframe of  claim 9 , wherein each of the supporting fingers comprises two contact balls configured to be in contact with a back side of a shutter disk. 
   
   
       11 . A transfer chamber assembly for a cluster tool, comprising:
 a main chamber having a central robot disposed therein, wherein the main chamber configured to connect to a plurality of chambers, the central robot is configured to shuttle one or more substrates among the plurality of chambers connected to the main chamber;   an extension chamber connected to the main chamber;   a shutter disk shelf disposed in the extension chamber, wherein the shutter disk shelf is configured to support one or more shutter disks therein, and the shutter disk shelf is accessible to the central robot.   
   
   
       12 . The transfer chamber assembly of  claim 11 , wherein main chamber and the extension chamber form a single vacuum enclosure. 
   
   
       13 . The transfer chamber assembly of  claim 12 , wherein the extension chamber has a low pressure port formed therein configured to connect to a vacuum system. 
   
   
       14 . The transfer chamber assembly of  claim 11 , wherein the shutter disk shelf is disposed in a first portion of an inner volume of the extension chamber, and a second portion of the inner volume of the extension chamber is configured to provide a passage for the central robot to access a load lock chamber or a pass through chamber connected to the extension chamber. 
   
   
       15 . The transfer chamber assembly of  claim 14 , wherein the shutter disk shelf is disposed in a lower portion of the inner volume. 
   
   
       16 . The transfer chamber assembly of  claim 14 , wherein the shutter disk shelf is movably disposed in the inner volume of the extension chamber. 
   
   
       17 . The transfer chamber assembly of  claim 16 , further comprising an indexer connected to the shutter disk shelf, wherein the indexer is configured to transfer the shutter disk shelf vertically in the extension chamber so that the shutter disk shelf is accessible to the central robot. 
   
   
       18 . A cluster tool configured to process semiconductor substrates, comprising:
 a first transfer chamber having a first central robot disposed therein;   a first extension chamber connected to the first transfer chamber, the first extension chamber having a first shutter disk shelf positioned therein, wherein the first shutter disk shelf is configured to support one or more shutter disks thereon, and the first shutter disk shelf is accessible by the first central robot;   one or more processing chambers connected to the first transfer chamber; and   a load lock chamber connected to the first extension chamber.   
   
   
       19 . The cluster tool of  claim 18 , further comprising:
 a pass through chamber connected to the first transfer chamber;   a second transfer chamber having a second central robot disposed therein, wherein the second transfer chamber is connected with the pass through chamber; and   one or more processing chambers connected to the second transfer chamber.   
   
   
       20 . The cluster tool of  claim 19 , further comprising a second extension chamber disposed between the pass through chamber and the second transfer chamber, wherein the second extension chamber comprises a second shutter disk shelf disposed therein and accessible to the second central robot. 
   
   
       21 . The cluster tool of  claim 18 , wherein the first shutter disk shelf is movably disposed in the first extension chamber. 
   
   
       22 . The cluster tool of  claim 18 , further comprising a pumping system connected to the first extension chamber, wherein the pumping system is configured to maintain a low pressure environment in the first extension chamber and the first transfer chamber.