Methods and apparatus for a cogeneration abatement system for electronic device manufacturing

Abstract

The present invention provides systems, methods, and apparatus for abating effluent from an electronic device manufacturing system using cogeneration. The invention includes a pump adapted to couple to a processing chamber and adapted to draw effluent from the processing chamber; a reaction chamber coupled to the pump and adapted to receive the effluent from the pump; and a turbine coupled to the reaction chamber and adapted to be driven by combustion gases from the reaction chamber. The turbine is adapted to generate power which is applied to operate the pump. Numerous additional aspects are disclosed.

1 . A system for electronic device manufacturing comprising:
 a processing chamber;   a pump coupled to the processing chamber and adapted to draw effluent from the processing chamber;   a reaction chamber coupled to the pump and adapted to receive the effluent from the pump; and   a turbine coupled to the reaction chamber and adapted to be driven by combustion gases from the reaction chamber,   wherein the turbine is adapted to generate power which is applied to operate the pump.   
   
   
       2 . The system of  claim 1  wherein the processing chamber is adapted to use at least one pre-cursor. 
   
   
       3 . The system of  claim 2  wherein the precursor includes at least one of SiH 4 , NF 3 , CF 4 , and BCl 3.    
   
   
       4 . The system of  claim 1  wherein the processing chamber includes a plurality of processing chambers. 
   
   
       5 . The system of  claim 1  wherein the pump includes a plurality of pumps. 
   
   
       6 . The system of  claim 5  wherein the plurality of pumps are arranged in parallel. 
   
   
       7 . The system of  claim 1  wherein the effluent includes at least one of H 2 , silane, methane, ammonia, and flammable PFCs. 
   
   
       8 . The system of  claim 1  wherein the turbine includes at least one of a ceramic turbine, a metal turbine, and a micro turbine. 
   
   
       9 . An apparatus for abating effluent from an electronic device manufacturing system comprising:
 a pump adapted to couple to a processing chamber and adapted to draw effluent from the processing chamber;   a reaction chamber coupled to the pump and adapted to receive the effluent from the pump; and   a turbine coupled to the reaction chamber and adapted to be driven by combustion gases from the reaction chamber,   wherein the turbine is adapted to generate power which is applied to operate the pump.   
   
   
       10 . The apparatus of  claim 9  wherein the processing chamber is adapted to use at least one pre-cursor. 
   
   
       11 . The apparatus of  claim 10  wherein the precursor includes at least one of SiH 4 , NF 3 , CF 4 , and BCl 3.    
   
   
       12 . The apparatus of  claim 9  wherein the processing chamber includes a plurality of processing chambers. 
   
   
       13 . The apparatus of  claim 9  wherein the pump includes a plurality of pumps. 
   
   
       14 . The apparatus of  claim 9  wherein the plurality of pumps are arranged in parallel. 
   
   
       15 . The apparatus of  claim 9  wherein the effluent includes at least one of H 2 , silane, methane, ammonia, and flammable PFCs. 
   
   
       16 . The apparatus of  claim 9  wherein the turbine includes at least one of a ceramic turbine, a metal turbine, and a micro turbine. 
   
   
       17 . A method of abating effluent from an electronic device manufacturing system comprising:
 pumping effluent from a processing chamber to a reaction chamber;   combusting the effluent in the reaction chamber;   driving a turbine with combustion gases from the reaction chamber;   generating power from the turbine; and   applying the power generated by the turbine to operate the pump.   
   
   
       18 . The method of  claim 17  further including flowing a pre-cursor into the processing chamber and wherein the precursor includes at least one of SiH 4 , NF 3 , CF 4 , and BCl 3.    
   
   
       19 . The method of  claim 17  wherein pumping effluent from a processing chamber includes pumping effluent from a plurality of processing chambers. 
   
   
       20 . The method of  claim 17  wherein pumping effluent from a processing chamber includes operating a plurality of pumps. 
   
   
       21 . The method of  claim 17  wherein pumping effluent includes pumping effluent that includes at least one of H 2 , silane, methane, ammonia, and flammable PFCs. 
   
   
       22 . The method of  claim 17  wherein driving a turbine includes driving at least one of a ceramic turbine, a metal turbine, and a micro turbine.