Process for the manufacture of HMG-CoA reductase inhibitory mevalonic acid derivatives

Abstract

The invention relates to a process for the manufacture of a compound of formula: (Formula I); or a salt, especially a pharmaceutically acceptable salt with a base, thereof or a lactone thereof wherein the element (a) represents —CH 2 —CH 2 CH— or —CH═CH— and R represents a cyclic radical.

1 - 7 . (canceled) 
   
   
       8 . A compound of formula (II d), 
     
       
         
         
             
             
         
       
     
     wherein
 L 1  is hydrogen and 
 L 2  represents phenyl or phenyl substituted by one, two, three, four or five alkyl residues, and 
 R 5  represents a residue selected from the group consisting of 2- or 3- or 4-pyridyl, 4-chloro-4-phenoxy-phenyl, 4-phenoxy-phenyl, 5-di(m)ethylamino-1-naphthyl, 5-nitro-1-naphthyl, 2-, 3-, 4-nitrophenyl, 4-vinylphenyl, 4-biphenylyl, 9-anthracenyl, 2,3-, 4-hydroxyphenyl, tolyl, phenanthryl, benzo[1,3]-dioxole, dimethyl(naphthalene-1-yl)-amine, mono to tristrifluoromethylphenyl, chrysenyl, perylenyl and pyrenyl or 2-phenylethene; 
 M is Ru, Rh, or Ir; and R 8  and R 9  is each independently phenyl or cyclohexyl or substituted phenyl. 
 
   
   
       9 . The compound of claim  4  wherein L 2  is phenyl or phenyl substituted by isopropyl. 
   
   
       10 . The compound of  claim 8  wherein L 2  is 4-isopropyl-phenyl. 
   
   
       11 . The compound of claim  4  wherein R 8  is phenyl and R 9  is phenyl. 
   
   
       12 . The compound of claim  4  wherein M is Ru.