Optical elements and methods of making optical elements

Abstract

The present invention provides an optical element including a silver halide-containing glass material having a concentration of less than 0.001 wt % cerium; and a refractive index pattern formed in the silver halide-containing glass material, the refractive index pattern including regions of high refractive index and regions of low refractive index, the difference between the refractive indices of the high refractive index regions and the low refractive index regions being at least 4×10 −5 at a wavelength of 633 nm. The present invention also provides methods for making optical elements from silver halide-containing glass materials.

1 - 15 . (canceled) 
   
   
       16 . A method of making an optical element, the method comprising the steps of
 providing a silver halide-containing glass material;   exposing the glass material to patterned ultraviolet radiation having a peak wavelength of less than about 300 nm, thereby forming exposed regions and unexposed regions; and   subjecting the exposed glass material to a heat treatment to form the optical element,   
     wherein exposed regions of the glass material have a substantially different refractive index than unexposed regions of the glass material after being subjected to the heat treatment. 
   
   
       17 . The method of  claim 16 , wherein the glass material has less than 0.001 wt % cerium. 
   
   
       18 . The method of  claim 16  wherein the glass material includes a weak reducing agent. 
   
   
       19 . The method of  claim 18  wherein the weak reducing agent is Sb 2 O 3 , and is present in a concentration of about 0.5 wt % to about 6 wt % 
   
   
       20 . The method of  claim 16  wherein the glass material has a melting temperature no greater than about 1650° C. 
   
   
       21 . The method of  claim 16  wherein the glass material comprises, in weight percent as calculated from the batch,
 about 5% to about 21% B 2 O 3 ;   about 35% to about 75% SiO 2 ;   about 5% to about 50% total of bivalent metal oxides selected from the group consisting of
 up to 50% PbO, 
 up to 15% ZnO, and 
 up to 5% BaO; 
   about 1% to about 4% of a weak reducing agent selected from the group consisting of Sb 2 O 3 .
 optionally, up to about 12% Na 2 O; 
 about 0.1% to about 1% Ag; and 
   about 0.1% to about 1% Cl.   
   
   
       22 . The method of  claim 16 , wherein the maximum index difference between the exposed regions of the optical element and the unexposed regions of the optical element is at least about 4×10 −5  at a wavelength of 633 nm. 
   
   
       23 . The method of  claim 16  wherein the heat treatment is performed at a temperature between about 450° C. and about 700° C. for a time between about 30 seconds and about 1 hour. 
   
   
       24 - 25 . (canceled) 
   
   
       26 . A method of making an optical element, the method comprising the steps of
 providing a silver halide-containing glass material;   exposing the glass material to pulsed patterned radiation having a peak wavelength of between 600 nm and 1000 nm, thereby forming exposed regions and unexposed regions; and   subjecting the exposed glass material to a heat treatment to form the optical element,   
     wherein exposed regions of the glass material have a substantially different refractive index than unexposed regions of the glass material after being subjected to the heat treatment. 
   
   
       27 . The method of  claim 26  wherein the pulses of the pulsed patterned radiation have pulsewidths of less than about 150 fs. 
   
   
       28 . The method of  claim 26 , wherein the glass material has less than 0.001 wt % cerium. 
   
   
       29 . The method of  claim 26  wherein the glass material has a melting temperature no greater than about 1650° C. 
   
   
       30 . The method of  claim 26  wherein the glass material comprises, in weight percent as calculated from the batch,
 about 5% to about 21% B 2 O 3 ;   about 35% to about 75% SiO 2 ;   about 5% to about 50% total of bivalent metal oxides selected from the group consisting of
 up to 50% PbO, 
 up to 15% ZnO, and 
 up to 5% BaO; 
   about 1% to about 4% of a weak reducing agent selected from the group consisting of Sb 2 O 3 ; SnO; FeO; and As 2 O 3 .   optionally, up to about 12% Na 2 O;   about 0.1% to about 1% Ag; and   about 0.1% to about 1% Cl.   
   
   
       31 . The method of  claim 26 , wherein the maximum index difference between the exposed regions of the optical element and the unexposed regions of the optical element is at least about 4×10 −5  at a wavelength of 633 nm. 
   
   
       32 - 33 . (canceled)