Methods for fabricating transflective liquid crystal displays

Abstract

A method for fabricating a display is disclosed. A first substrate comprising a plurality of pixels is provided, each pixel comprises a plurality of sub pixels. A second substrate substantially opposite to the first substrate is provided, wherein the second substrate is divided into a plurality of regions corresponding to the sub-pixels, and at least three of the regions are color regions and at least one of the regions is a fourth region. A photoresist pattern layer is formed on the second substrate, such that the photoresist pattern layer corresponding to the at least three color regions are color photoresist pattern layers and the photoresist pattern layer corresponding to the at least one fourth region is a fourth photoresist pattern layer. A first covering layer is formed on the photoresist layer. A liquid crystal layer is interposed between the first substrate and the second substrate.

1 . A method for fabricating a display comprising:
 providing a first substrate comprising a plurality of pixels, each pixel comprises a plurality of sub pixels;   providing a second substrate substantially opposite to the first substrate, wherein the second substrate is divided into a plurality of regions corresponding to the sub-pixels, and at least three of the regions are color regions and at least one of the regions is a fourth region;   forming a photoresist pattern layer on the second substrate, such that the photoresist pattern layer corresponding to the at least three color regions are color photoresist pattern layers and the photoresist pattern layer corresponding to the at least one fourth region is a fourth photoresist pattern layer;   forming a first covering layer on the photoresist layer; and   interposing a liquid crystal layer between the first substrate and the second substrate.   
   
   
       2 . The method of  claim 1 , wherein the first covering layer has a substantially uniform thickness. 
   
   
       3 . The method of  claim 1 , further comprising:
 forming a second covering layer on the first substrate.   
   
   
       4 . The method of  claim 3 , wherein the second covering layer has a substantially uniform thickness. 
   
   
       5 . The method of  claim 3 , wherein the first covering layer and the second covering layer both have substantially uniform thicknesses. 
   
   
       6 . The method of  claim 3 , wherein formation the photoresist pattern layer comprises:
 coating the photoresist layer on the second substrate; and   patterning the photoresist layer to define the photoresist layer corresponding to the at least three color regions as the color resist pattern layers and to define the photoresist layer corresponding to the at least one fourth region as the fourth resist pattern layer.