Method and apparatus for high-pressure atomic-beam laser induced deposition/etching

Abstract

A method for carrying out pulsed laser deposition is disclosed. The method comprises providing a target having a desired composition; irradiating the target with a pulsed laser beam to provide a plume of target material; and directing the plume in a desired direction by use of an inert carrier gas. The plume of target material is passed through an aperture to create an atomic beam. One or both of the plume or the atomic beam is irradiated to reduce the amount of agglomerated particles in the atomic beam. The atomic beam is directed onto a substrate to produce a deposition product. An apparatus for carrying out the method is also disclosed.

1 . An apparatus for carrying out atomic or molecular beam deposition, the apparatus comprising:
 a precursor delivery system;   a target within the precursor delivery system;   a first optic configured to direct a laser beam at the target;   a first wall having an aperture;   a substrate configured to receive an atomic and/or molecular beam; and   a second optic configured to direct a laser beam at a point proximate to the aperture in the first wall, used to generate an atomic and/or molecular beam.   
   
   
       2 . The apparatus of  claim 1 , wherein the apparatus is configured to provide an electrical potential between the first wall and the substrate. 
   
   
       3 . The apparatus of  claim 1 , further comprising a third optic configured to direct a laser beam at a point proximate to the substrate. 
   
   
       4 . The apparatus of  claim 1 , further comprising a second wall having an aperture. 
   
   
       5 . The apparatus of  claim 4 , further comprising a third optic configured to direct a laser beam at a point proximate to the aperture in the second wall. 
   
   
       6 . The apparatus of  claim 1 , further comprising a fourth optic configured to direct a laser beam at a point proximate to the substrate and the second optic is configured to direct a laser beam at a point proximate to the aperture in the first wall. 
   
   
       7 . The apparatus of  claim 4 , wherein the apparatus is configured to introduce a reactive gas into the region between the first wall and the second wall. 
   
   
       8 . A method for carrying out atomic or molecular beam deposition, the method comprising:
 providing a flow of precursor(s);   providing a target having a desired composition;   irradiating the target with a pulsed laser beam to provide a plume of target material;   directing the plume in a desired direction by use of the flow of precursors;   passing the flow of precursors and plume of target material through an aperture;   irradiating the flow of precursors and plume of target material to create an atomic or molecular beam; and   directing the atomic or molecular beam onto a substrate to produce a deposition product.   
   
   
       9 . The method of  claim 8 , wherein the deposition product is a fiber or a thin film. 
   
   
       10 . The method of  claim 8 , further comprising passing the atomic beam through a second aperture. 
   
   
       11 . The method of  claim 10 , further comprising irradiating the beam a second time. 
   
   
       12 . The method of  claim 11 , further comprising adding a reactive gas to the atomic beam. 
   
   
       13 . The method of  claim 12 , wherein the reactive gas comprises a hydrocarbon. 
   
   
       14 . The method of  claim 8 , further comprising selectively removing species from the atomic beam by us of an applied magnetic field. 
   
   
       15 . A deposition product produced according to the method of  claim 8 . 
   
   
       16 . The deposition product of  claim 17 , wherein the deposition product comprises a fiber. 
   
   
       17 . The deposition product of  claim 17 , wherein the deposition product comprises a thin film. 
   
   
       18 . The deposition product of  claim 17 , wherein the thin film comprises diamond. 
   
   
       19 . A method for carrying out atomic or molecular beam deposition, the method comprising:
 providing a flow of precursor(s);   providing a target having a desired composition;   irradiating the target with a laser beam to provide a plume of target material;   directing the plume in a desired direction by use of the flow of precursors;   passing the flow of precursors and plume of target material through an aperture;   irradiating the flow of precursors and plume of target material with a second laser beam to create an atomic or molecular beam;   directing the atomic or molecular beam onto a substrate to produce a deposition product; and   directing a third laser beam at a point proximate to where the atomic or molecular beam impinges on the substrate.