US2009145802A1PendingUtilityA1
Storage system for components incorporating a liquid-metal thermal interface
Est. expiryDec 11, 2027(~1.4 yrs left)· nominal 20-yr term from priority
Inventors:Michael D. HillmanGregory L. TiceOscar WooRichard Lidio Blanco, Jr.Ronald J. SmithSean BaileyAnwyl M. McdonaldClayton R. Anderson
H10W 76/48H10W 40/70
41
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Claims
Abstract
Embodiments of an apparatus that functions as a storage system for components are described. This apparatus includes a containment vessel enclosing a desiccant and a device. This device includes a layer mechanically coupled to a component, where the component can be one of a semiconductor die and a heat-removal device. Moreover, a thermal-interface material is coupled to a region of the layer, and a boundary material is mechanically coupled to the layer, where a perimeter defined by the boundary-material surrounds the region.
Claims
exact text as granted — not AI-modified1 . An apparatus, comprising:
a containment vessel enclosing a desiccant and a device, wherein the device includes:
a layer mechanically coupled to a component, wherein the component can be one of a semiconductor die and a heat-removal device;
a thermal-interface material coupled to a region of the layer; and
a boundary material mechanically coupled to the layer, wherein a perimeter defined by the boundary-material surrounds the region.
2 . The apparatus of claim 1 , further comprising an exterior containment vessel enclosing the containment vessel.
3 . The apparatus of claim 1 , further comprising another desiccant within the exterior containment vessel but outside of the containment vessel.
4 . The apparatus of claim 1 , wherein the thermal-interface material includes a material that is a liquid metal over a range of operating temperatures of the semiconductor die.
5 . The apparatus of claim 1 , wherein at least one of the layer and an inner surface of the boundary material includes a material that is resistant to corrosion by the thermal-interface material.
6 . The apparatus of claim 5 , wherein the material includes a metal.
7 . The apparatus of claim 5 , wherein the material includes nickel, a nickel alloy, or stainless steel.
8 . The apparatus of claim 1 , wherein at least one of the layer and an inner surface of the boundary material includes a material that has a permeability for water that is less than a pre-determined value.
9 . The apparatus of claim 1 , wherein the layer is deposited or adhered onto the component.
10 . The apparatus of claim 1 , wherein the boundary material is mechanically coupled to the layer by grease.
11 . The apparatus of claim 1 , wherein the semiconductor die includes a processor.
12 . The apparatus of claim 1 , wherein the thermal-interface material includes a gallium-indium-tin alloy.
13 . An apparatus, comprising:
a layer mechanically coupled to a component, wherein the component can be one of a semiconductor die and a heat-removal device; another layer mechanically coupled to another component; a thermal-interface material between the component and the other component, wherein the thermal-interface material is mechanically coupled to a region of the layer and to a region of the other layer; and a boundary material mechanically coupled to the layer and the other layer, wherein the thermal-interface material is contained in a cavity defined, at least in part, by the layer, the boundary material, and the other layer.
14 . The apparatus of claim 13 , further comprising a desiccant within the cavity.
15 . The apparatus of claim 13 , wherein the thermal-interface material includes a material that is a liquid metal over a range of operating temperatures of the semiconductor die.
16 . The apparatus of claim 13 , wherein at least one of the layer, the other layer and an inner surface of the boundary material includes a material that is resistant to corrosion by the thermal-interface material.
17 . The apparatus of claim 16 , wherein the material includes a metal.
18 . The apparatus of claim 16 , wherein the material includes nickel, a nickel alloy, or stainless steel.
19 . The apparatus of claim 13 , wherein at least one of the layer, the other layer and an inner surface of the boundary material includes a material that has a permeability for water that is less than a pre-determined value.
20 . The apparatus of claim 13 , wherein the layer is deposited or adhered onto the component.
21 . The apparatus of claim 13 , wherein the boundary material is mechanically coupled to the layer and the other layer by grease.
22 . The apparatus of claim 13 , wherein the semiconductor die includes a processor.
23 . The apparatus of claim 13 , wherein the thermal-interface material includes a gallium-indium-tin alloy.
24 . The apparatus of claim 13 , further comprising:
a containment vessel enclosing the apparatus; and a desiccant within the containment vessel.Cited by (0)
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