US2009165320A1PendingUtilityA1
Photocurable perfluoropolyethers for use as novel materials in microfluidic devices
Est. expirySep 23, 2023(expired)· nominal 20-yr term from priority
Inventors:Joseph M. DesimoneJason P. RollandStephen R. QuakeDerek SchorzmanJason YarbroughMichael Van Dam
B01L 2200/12B81B 2201/058F16K 99/0065Y10T428/3154B01L 3/502738G03F 7/0002F16K 99/0059C08G 2650/48B01L 3/502707F16K 99/0051F16K 99/0034B81B 1/006B81C 2201/034C09D 163/00F16K 2099/008Y10T428/24479B01L 2300/0816B01L 2400/0481B01L 7/52B82Y 40/00B82Y 10/00F16K 99/0026F16K 99/0061C08G 65/007F16K 99/0001C08G 18/8116F16K 99/0042B81B 2203/0323C09D 171/02F16K 2099/0084Y10T137/0396F16K 99/0036C08G 18/5015F16K 99/0015B01L 2400/0655C08G 65/33348F16K 2099/0086F16K 99/0046Y10T428/249954B01L 3/0268
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Claims
Abstract
A functionalized photocurable perfluoropolyether is used as a material for fabricating a solvent-resistant microfluidic device. Such solvent-resistant microfluidic devices can be used to control the flow of small amounts of a fluid, such as an organic solvent, and to perform microscale chemical reactions that are not amenable to other polymer-based microfluidic devices.
Claims
exact text as granted — not AI-modified1 . An apparatus having a microscale feature, comprising:
a first component defining a pattern, wherein the first component comprises an elastomeric material that is substantially resistant to swelling when in communication with substantially any organic solvent.
2 . The apparatus of claim 1 , wherein the elastomeric material comprises a perfluoropolyether.
3 . The apparatus of claim 1 , wherein the pattern comprises a recess.
4 . The apparatus of claim 3 , further comprising a plurality of recesses defined in the first component.
5 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 1000 micrometers.
6 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 500 micrometers.
7 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 250 micrometers.
8 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 240 micrometers.
9 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 230 micrometers.
10 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 220 micrometers.
11 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 210 micrometers.
12 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 200 micrometers.
13 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 190 micrometers.
14 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 180 micrometers.
15 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 170 micrometers.
16 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 160 micrometers.
17 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 150 micrometers.
18 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 140 micrometers.
19 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 130 micrometers.
20 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 120 micrometers.
21 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 110 micrometers.
22 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 100 micrometers.
23 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 90 micrometers.
24 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 80 micrometers.
25 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 75 micrometers.
26 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 70 micrometers.
27 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 60 micrometers.
28 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 50 micrometers.
29 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 40 micrometers.
30 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 30 micrometers.
31 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 25 micrometers.
32 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 22.5 micrometers.
33 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 20 micrometers.
34 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 17.5 micrometers.
35 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 15 micrometers.
36 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 12.5 micrometers.
37 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 10 micrometers.
38 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 7.5 micrometers.
39 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 5 micrometers.
40 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 4 micrometers.
41 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 3 micrometers.
42 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 2 micrometers.
43 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 1 micrometer.
44 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 0.5 micrometer.
45 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 0.2 micrometer.
46 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 0.1 micrometer.
47 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 0.05 micrometer.
48 . The apparatus of claim 3 , wherein the recess includes a dimension less than about 0.02 micrometer.
49 . The apparatus of claim 3 , wherein the recess includes a dimension of about 0.01 micrometer.
50 . The apparatus of claim 3 , wherein the recess includes a width-to-depth ratio of between about 0.1:1 to about 100:1.
51 . The apparatus of claim 3 , wherein the recess includes a width-to-depth ratio of between about 1:1 to about 50:1.
52 . The apparatus of claim 3 , wherein the recess includes a width-to-depth ratio of between about 2:1 to about 20:1.
53 . The apparatus of claim 3 , wherein the recess includes a width-to-depth ratio of between about 3:1 to about 15:1.
54 . The apparatus of claim 3 , wherein the recess includes a width-to-depth ratio of about 10:1.
55 . The apparatus of claim 3 , wherein the recess includes a substantially rectangular predetermined shape.
56 . The apparatus of claim 3 , wherein the recess includes a substantially trapezoidal predetermined shape.
57 . The apparatus of claim 3 , wherein the recess includes a substantially circular predetermined shape.
58 . The apparatus of claim 3 , wherein the recess includes a substantially ellipsoidal predetermined shape.
59 . The apparatus of claim 3 , wherein the recess includes a substantially parabolic predetermined shape.
60 . The apparatus of claim 3 , wherein the recess includes a substantially hyperparabolic predetermined shape.
61 . The apparatus of claim 3 , wherein the recess includes a substantially polygonal predetermined shape.
62 . An apparatus having a microscale feature, comprising:
a first component defining a pattern, wherein the first component comprises a perfluoropolyether.
63 . The apparatus of claim 62 , wherein the pattern includes a plurality of microscale reservoirs.
64 . The apparatus of claim 63 , wherein each microscale reservoir of the plurality of microscale reservoirs has a dimension between about 0.01 micrometer and about 1000 micrometers.
65 . The apparatus of claim 63 , wherein each microscale reservoir of the plurality of microscale reservoirs has a dimension between about 0.05 micrometer and about 1000 micrometers.
66 . The apparatus of claim 63 , wherein each microscale reservoir of the plurality of microscale reservoirs has a dimension between about 1 micrometer and about 1000 micrometers.
67 . The apparatus of claim 63 , wherein each microscale reservoir of the plurality of microscale reservoirs has a dimension between about 0.2 micrometer and about 250 micrometers.
68 . The apparatus of claim 3 , wherein each microscale reservoir of the plurality of microscale reservoirs includes a width-to-depth ratio of between about 0.1:1 to about 100:1.
69 . The apparatus of claim 3 , wherein each microscale reservoir of the plurality of microscale reservoirs includes a width-to-depth ratio of between about 1:1 to about 50:1.
70 . The apparatus of claim 3 , wherein each microscale reservoir of the plurality of microscale reservoirs includes a width-to-depth ratio of between about 2:1 to about 20:1.
71 . The apparatus of claim 3 , wherein each microscale reservoir of the plurality of microscale reservoirs includes a width-to-depth ratio of between about 3:1 to about 15:1.
72 . The apparatus of claim 3 , wherein each microscale reservoir of the plurality of microscale reservoirs includes a width-to-depth ratio of about 10:1.
73 . An apparatus having a microscale feature, comprising:
a first component defining a pattern, wherein the first component comprises a perfluoropolyether, and wherein the pattern includes a recess having a dimension less than about 1000 micrometers.Cited by (0)
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