Manufacturing Method of Isothermal Vapor Chamber And Product Thereof

Abstract

A manufacturing method of a isothermal vapor chamber and a product thereof are to use an integrated manner to form an orifice directly on a plate body of a isothermal vapor chamber. Through the orifice, the operations of injecting working fluid and degassing or vacuating can be proceeded. The orifice is functionally similar to a degassing tube or a vacuating tube of the prior arts. However, since the orifice is integrated on the plate body of the isothermal vapor chamber body, it can be pressed to seal the isothermal vapor chamber after an operation of degassing. Therefore, the vacuity in the isothermal vapor chamber and the stored amount of the working fluid, and it is easier for manufacture.

1 . A manufacturing method of an isothermal vapor chamber, including following steps:
 a) combining corresponding two plates to form a hollow plate body having an accommodating space therein;   b) integratedly forming a projected orifice on one of the plates, wherein the orifice communicates to the accommodating space;   c) sealing circumferential edges of the plate body except the orifice;   d) vacuating the accommodating space in the plate body via the orifice; and   e) pressing the orifice to close up.   
   
   
       2 . The manufacturing method according to  claim 1 , wherein step c) further includes sealing the two plates by means of welding. 
   
   
       3 . The manufacturing method of according to  claim 2 , wherein the welding means is meant by a diffusive or plasma welding process. 
   
   
       4 . The manufacturing method according to  claim 1 , wherein step d) further includes injecting a working fluid into the plate body via the orifice. 
   
   
       5 . The manufacturing method according to  claim 1 , further comprising a step f after the step e:
 melting the orifice.   
   
   
       6 . An isothermal vapor chamber, comprising:
 a hollow plate body composed of two plates, having an accommodating space therein, wherein circumferential edges of the plate body are all formed as sealing sides, outer edges of the sealing sides are all arranged with welding portions, a projected orifice integratedly extends from one of the sealing sides, and one portion of the orifice is of a flat shape to be sealed; and   a capillary structure attached on inner walls of the plate body.   
   
   
       7 . The isothermal vapor chamber according to  claim 6 , wherein each contour of the two plates is of a rectangular shape, and at least one beveled corner is reserved at an intersection of any two adjacent sealing sides of the two plate, while the orifice is located at the corner. 
   
   
       8 . The isothermal vapor chamber according to  claim 6 , wherein each contour of the two plates is of a circular shape. 
   
   
       9 . The isothermal vapor chamber according to  claim 6 , wherein the orifice includes a shrunk tube and an expanded tube communicated to one end of the shrunk tube, and the flat part of the orifice is just the shrunk tube. 
   
   
       10 . The isothermal vapor chamber according to  claim 9 , wherein an outer edge of the expanded tube of the orifice is further formed as a sealing side.