Synthetic silica glass optical material having high resistance to laser induced damage

Abstract

Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633 nm, of between about −1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm 2 . The synthetic silica glass optical material of the present invention comprises OH concentration levels of less than about 600 ppm, preferably less than 200 ppm, and H 2 concentration levels less than about 5.0×10 17 molecules/cm 3 ′ and preferably less than about 2.0×10 17 molecules/cm 3 .

1 . A synthetic silica glass optical material for use, and resistant to optical damage, in the wavelength region of less than 250 nm, the synthetic silica glass optical material comprising a H 2  concentration less than about 5.0×10 17  molecules/cm 3 , having an OH concentration less than about 600 ppm, and exhibiting a laser induced wavefront distortion, measured at 633 nm, of between −1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm 2 . 
   
   
       2 . The synthetic silica glass optical material of  claim 1 , wherein the H 2  concentration ranges between about 0.4 to 5.0×10 17  molecules/cm 3  and the OH concentration is less than about 200 ppm. 
   
   
       3 . The synthetic silica glass optical material of  claim 1 , wherein the H 2  concentration is less than about 2.0×10 17  molecules/cm 3  and the OH concentration is less than about 200 ppm. 
   
   
       4 . The synthetic silica glass optical material of  claim 3 , wherein the OH concentration ranges between about 30 to 200 ppm. 
   
   
       5 . The synthetic silica glass optical material of  claim 1 , wherein the H 2  concentration ranges between about 0.1 to 2.0×10 17  molecules/cm 3  and the OH concentration is less than about 125 ppm. 
   
   
       6 . The synthetic silica glass optical material of  claim 5 , wherein the OH concentration ranges between about 50 to 100 ppm. 
   
   
       7 . The synthetic silica glass optical material of  claim 3 , wherein the OH concentration ranges between about 0.1 to 100 ppm and the H 2  concentration ranges between about 0.1 to 1.0×10 17  molecules/cm 3 . 
   
   
       8 . The synthetic silica glass optical material of  claim 7 , wherein the OH concentration ranges between about 0.1 to 50 ppm. 
   
   
       9 . The synthetic silica glass optical material of  claim 8  wherein the H 2  concentration ranges between about 0.4 to 1.0×10 17  molecules/cm 3 . 
   
   
       10 . The synthetic silica glass optical material of  claim 1  exhibiting a laser induced wavefront distortion, measured at 633 nm, of between −0.1 and 1.0 nm/cm when subjected to 10 billion pulses of a laser at operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm 2 . 
   
   
       11 . The synthetic silica glass optical material of  claim 1  exhibiting a laser induced wavefront distortion, measured at 633 nm, of between −0.5 and 0.5 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 40 μJ/cm 2 . 
   
   
       12 . The synthetic silica glass optical material of  claim 11  exhibiting a laser induced wavefront distortion, measured at 633 nm, of between −0.1 and 0.5 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 40 μJ/cm 2 . 
   
   
       13 . A synthetic silica glass optical material for use, and resistant to optical damage, in the wavelength region of less than 250 nm, the synthetic silica glass optical material having a H 2  concentration ranging between about 0.1 to 5.0×10 17  molecules/cm 3 , an OH concentration less than about 125 ppm, and exhibiting a laser induced wavefront distortion, measured at 633 nm, of between −1.0 to 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm 2 . 
   
   
       14 . The synthetic silica glass optical material of  claim 13 , wherein the H 2  concentration ranges between about 0.4 to 5.0×10 17  molecules/cm 3 . 
   
   
       15 . The synthetic silica glass optical material of  claim 14 , wherein the H 2  concentration ranges between about 0.4 to 2.0×10 17  molecules/cm 3 . 
   
   
       16 . The synthetic silica glass optical material of  claim 13 , wherein the OH concentration ranges between about 0.1 to 100 ppm. 
   
   
       17 . The synthetic silica glass optical material of  claim 13  exhibiting a laser induced wavefront distortion, measured at 633 nm, of between −0.1 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm operating and at a fluence of approximately 70 μJ/cm 2 . 
   
   
       18 . The synthetic silica glass optical material of  claim 13  exhibiting a laser induced wavefront distortion, measured at 633 nm, of between −0.5 and 0.5 nm/cm when subjected to 10 billion pulses of a laser at approximately 193 nm operating at a fluence of approximately 40 μJ/cm 2 . 
   
   
       19 . The synthetic silica glass optical material of  claim 18  exhibiting a laser induced wavefront distortion, measured at 633 nm, of between −0.1 and 0.5 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm operating and at a fluence of approximately 40 μJ/cm 2 . 
   
   
       20 . A synthetic silica glass optical material for use, and resistant to optical damage, in the wavelength region of less than 250 nm, the synthetic silica glass optical material having a H 2  concentration ranging between about 0.4 to 1.0×10 17  molecules/cm 3 , an OH concentration less than about 600 ppm, and exhibiting a laser induced wavefront distortion, measured at 633 nm, of between about −1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm 2 . 
   
   
       21 . The synthetic silica glass optical material of  claim 20 , wherein the OH concentration is less than about 200 ppm. 
   
   
       22 . The synthetic silica glass optical material of  claim 21  exhibiting a laser induced wavefront distortion, measured at 633 nm, of between about −0.1 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm 2 . 
   
   
       23 . The synthetic silica glass optical material of  claim 20  exhibiting a laser induced wavefront distortion, measured at 633 nm, of between −0.5 and 0.5 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 40 μJ/cm 2 . 
   
   
       24 . The synthetic silica glass optical material of  claim 23  exhibiting a laser induced wavefront distortion, measured at 633 nm, of between −0.1 and 0.5 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 40 μJ/cm 2 . 
   
   
       25 . The synthetic silica glass optical material of  claim 20 , wherein the OH concentration ranges between about 0.1 to 200 ppm. 
   
   
       26 . A synthetic silica glass optical material for use, and resistant to optical damage, in the wavelength region of less than 250 nm, the synthetic silica glass optical material having a H 2  concentration from 0.4 to 1.0×10 17  molecules/cm 3 , an OH concentration from 100 to about 600 ppm, and exhibiting a laser induced wavefront distortion, measured at 633 nm, of between −1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm 2 . 
   
   
       27 . A synthetic silica glass optical material for use, and resistant to optical damage, in the wavelength region of less than 250 nm, the synthetic silica glass optical material having a H 2  concentration from 0.1 to 0.5×10 17  molecules/cm 3 , an OH concentration from 100 to 125 ppm, and exhibiting a laser induced wavefront distortion, measured at 633 nm, of between about −1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser at operating approximately 193 nm and at a fluence of approximately 70 μJ/cm 2 . 
   
   
       28 . A method for producing a synthetic silica glass optical material comprising the steps of:
 a) producing a gas stream containing a silicon-containing compound in vapor form capable of being converted through thermal decomposition with oxidation or flame hydrolysis to silica and passing the gas stream into the flame of a combustion burner to form amorphous particles of fused silica soot;   b) depositing the fused silica soot particles onto a support to form a fused silica soot preform;   c) consolidating the soot preform into a transparent glass body; and   d) hydrogen loading the glass body by heating the glass body in the presence of H 2 -containing gas to a temperature sufficient to result in diffusion of H 2  into the glass body;   thereby resulting in a silica glass optical material comprising a H 2  concentration less than about 5.0×10 17  molecules/cm 3 , an OH concentration less than about 600 ppm, and exhibiting a laser induced wavefront distortion, measured at 633 nm, of between about −1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm 2 .   
   
   
       29 . The method according to  claim 28  wherein the glass body has a H 2  concentration less than about 2.0×10 17  molecules/cm 3 , an OH concentration of less about 200 ppm and the hydrogen loading step is performed at a temperature of less than about 800° C. 
   
   
       30 . The method according to  claim 29  wherein the hydrogen loading step is performed at a temperature of less than about 600° C.