Method of making low-E coating using ceramic zinc inclusive target, and target used in same

Abstract

A ceramic target is used in sputter-depositing a contact layer adjacent an infrared (IR) reflecting layer in certain example embodiments. For example, a ZnO x ceramic target may be used in sputter-depositing a zinc oxide inclusive layer over and/or under a silver based IR reflecting layer in certain embodiments. In certain example embodiments, the ceramic target may be doped with a non-metal such as F and/or B.

1 - 21 . (canceled) 
     
     
         22 . A sputtering target comprising:
 a material to be sputtered from the target, the material comprising one or more of: (a) substoichiometric zinc oxide; (b) zinc, or zinc oxide, doped with boron; and (c) zinc oxide doped with from about 0.5 to 5.0% fluorine.   
     
     
         23 . (canceled) 
     
     
         24 . The target of  claim 22 , wherein the target comprises zinc oxide doped with from about 0.5 to 5.0% fluorine. 
     
     
         25 . The target of  claim 22 , wherein the target comprises substoichiometric zinc oxide doped with from about 0.5 to 5.0% fluorine. 
     
     
         26 . The target of  claim 22 , wherein the target comprises substoichiometric zinc oxide doped with boron.