US2009217521A1PendingUtilityA1

Display substrate, method of manufacturing the same and display device having the same

Assignee: YANG YONG-HOPriority: Jun 30, 2005Filed: May 13, 2009Published: Sep 3, 2009
Est. expiryJun 30, 2025(expired)· nominal 20-yr term from priority
Inventors:Yong-Ho Yang
G02F 1/1333G02F 1/136Y10T29/49155G02F 1/133388G02F 1/13454G02F 1/133512
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Claims

Abstract

A display substrate includes a substrate, a first capacitor electrode, a dielectric layer, a second capacitor electrode, and a transparent conductive electrode. The substrate includes an effective display region and a non-effective display region that surrounds the effective display region. The first capacitor electrode is in the non-effective display region. The dielectric layer is on the first capacitor electrode. The second capacitor electrode is on the dielectric layer corresponding to the first capacitor electrode. The transparent conductive electrode is positioned substantially in the effective display region. Therefore, the number of elements is decreased so that a size and a manufacturing cost of a display device are reduced.

Claims

exact text as granted — not AI-modified
1 . A method of manufacturing a display substrate comprising: forming a metal thin film on a substrate having an effective display region and a non-effective display region; patterning the metal thin film to form a first capacitor pattern in the non-effective display region; forming a dielectric layer on the substrate having the first capacitor; forming a transparent conductive thin film on the dielectric layer; and patterning the transparent conductive thin film to form a second capacitor electrode on the dielectric layer positioned corresponding to the first capacitor electrode in the non-effective display region, and a transparent electrode positioned substantially in the effective display region. 
   
   
       2 . The method of  claim 1 , wherein the metal thin film comprises at least one of chromium and chromium oxide. 
   
   
       3 . The method of  claim 1 , wherein the dielectric layer is positioned in the non-effective display region. 
   
   
       4 . The method of  claim 3 , wherein the dielectric layer is directly formed in the non-effective display region through a shadow mask. 
   
   
       5 . The method of  claim 1 , wherein the dielectric layer includes a portion positioned in the effective display region and a portion positioned in the non-effective display region. 
   
   
       6 . The method of  claim 1 , wherein the patterning of the metal thin film further comprises forming a black matrix in the effective display region, and the method of manufacturing the display substrate further comprises forming a color filter in an opening of the black matrix.

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