Dyed photoresists and methods and articles of manufacture comprising same

Abstract

The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.

1 - 21 . (canceled) 
   
   
       22 . A photoresist composition comprising a polymer binder, a photoactive component and a dye compound that contains anthracene groups, said dye compound being a polymer wherein the polymer has a weight average molecular weight of at least about 5,000. 
   
   
       23 . The photoresist of  claim 22  wherein the dye is a copolymer. 
   
   
       24 . The photoresist of  claim 22  wherein the dye is a copolymer that contains anthracene and acrylic units. 
   
   
       25 . The photoresist of  claim 22  wherein the dye compound comprises a structure of the following Formula I: 
     
       
         
         
             
             
         
       
       wherein each R is independently substituted or unsubstituted alkyl; 
       W is a bond or substituted or unsubstituted alkylene; 
       each R1 may be independently halogen; substituted or unsubstituted alkyl; substituted or unsubstituted alkoxy; substituted or unsubstituted alkenyl; substituted or unsubstituted alkynyl; substituted or unsubstituted alkylthio; cyano; nitro; amino; hydroxyl; 
       m is an integer of from 0 to 9; 
       x and y are the mole fractions of the respective units; and 
       each Z is a bridge group between polymer units. 
     
   
   
       26 . The photoresist of  claim 22  wherein the dye comprises a structure of the following formula III: 
     
       
         
         
             
             
         
       
     
   
   
       27 . The photoresist of  claim 22  wherein the resist is a positive-acting resist. 
   
   
       28 . The photoresist of  claim 22  wherein the resist is a negative-acting resist. 
   
   
       29 . An article of manufacture comprising a substrate that is a microelectronic wafer of a flat panel display, the substrate having coated thereon the photoresist composition of  claim 22 . 
   
   
       39 . The photoresist composition of  claim 22  wherein the polymer comprises phenolic and non-phenolic units. 
   
   
       40 . The photoresist composition of  claim 22  wherein the polymer comprises acid labile groups on non-phenolic polymer units. 
   
   
       41 . The photoresist composition of  claim 22  wherein the polymer is a non-phenolic resin. 
   
   
       42 . The photoresist composition of  claim 42  wherein the polymer binder comprises polymerized alkyl acrylate units and vinylalicyclic units. 
   
   
       43 . A light sensitive composition that comprises a resin binder, a photoacid generator compound and a polymeric dye that contains one or more polycyclic chromophores, said dye compound being a polymer wherein the polymer has a weight average molecular weight of at least about 5,000. 
   
   
       44 . The light sensitive composition of  claim 43  wherein the chromophores absorb deep UV radiation. 
   
   
       45 . The light sensitive composition of  claim 43  wherein the chromophores are selected from the group consisting of anthryl, phenanthryl, acridine, quinolinyl and ring-substituted quinolinyl. 
   
   
       46 . The light sensitive composition of  claim 43  wherein the dye is a copolymer. 
   
   
       47 . The light sensitive composition of  claim 43  wherein the dye is an acrylic copolymer. 
   
   
       48 . The light sensitive composition of  claim 43  wherein the chromophores are selected from the group consisting of phenanthryl, acridine, quinolinyl and ring-substituted quinolinyl. 
   
   
       49 . The photoresist composition of claim  1  wherein the photoresist is a chemically-amplified positive-acting resist. 
   
   
       50 . A chemically-amplified photoresist composition comprising a polymer binder, a photoactive component and dye polymer has a weight average molecular weight of at least about 5,000 and comprises copolymer that contains anthracene and acrylic units. 
   
   
       51 . The photoresist composition of  claim 50  wherein the polymer binder comprises phenolic and non-phenolic units. 
   
   
       52 . The photoresist composition of  claim 51  wherein the polymer binder comprises acid labile groups on non-phenolic polymer units. 
   
   
       53 . The photoresist composition of  claim 50  wherein the polymer binder is a non-phenolic resin. 
   
   
       54 . The photoresist composition of  claim 50  wherein the polymer binder comprises polymerized alkyl acrylate units and a vinylalicyclic units. 
   
   
       55 . A chemically-amplified photoresist composition comprising a non-phenolic polymer binder, a photoactive component and dye polymer that has a weight average molecular weight of at least about 5,000 and comprises anthracene groups. 
   
   
       56 . The photoresist composition of  claim 55  wherein the polymer binder comprises polymerized alkyl acrylate units and vinylalicyclic units. 
   
   
       57 . A chemically-amplified positive photoresist composition comprising a non-phenolic resin binder, a photoactive component and a polymeric dye that contains one or more polycyclic chromophores, the dye polymer having a weight average molecular weight of at least about 5,000. 
   
   
       58 . The photoresist composition of  claim 50  wherein the polymer binder comprises polymerized alkyl acrylate units and vinylalicyclic units. 
   
   
       59 . A chemically-amplified positive photoresist composition comprising (1) a non-phenolic resin binder comprising polymerized alkyl acrylate units and vinylalicyclic units, (2) a photoactive component that comprises iodonium or sulfonium compounds and (3) a polymeric dye that contains one or more chromophores. 
   
   
       60 . The photoresist composition of  claim 59  wherein the polymeric dye has a weight average molecular weight of at least about 5,000. 
   
   
       61 . The photoresist composition of  claim 59  wherein the photoactive component comprises an iodonium compound. 
   
   
       62 . The photoresist composition of  claim 59  wherein the photoactive component comprises a sulfonium compound.