US2009238517A1PendingUtilityA1

Monolithically integrated optical devices with amorphous silicon arrayed waveguidi gratings and INGaAsP gain

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Assignee: NOVATRONIX CORPPriority: Oct 7, 2005Filed: May 12, 2009Published: Sep 24, 2009
Est. expiryOct 7, 2025(expired)· nominal 20-yr term from priority
G02B 2006/121G02B 6/12019G02B 6/12004G02B 2006/12061G02B 6/122
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Claims

Abstract

An optical waveguide assembly and method of forming the same is described. The optical waveguide assembly includes a waveguide, an amorphous silicon arrayed waveguide grating communicative with the waveguide, and an integrated amorphous silicon waveguide grating laser which communicatively outputs a laser output responsive to the amorphous silicon arrayed waveguide grating. The method includes providing a waveguide, providing an amorphous silicon arrayed waveguide grating communicative with the waveguide, and providing an integrated amorphous silicon waveguide grating laser which communicatively outputs a laser output responsive to the amorphous silicon arrayed waveguide grating.

Claims

exact text as granted — not AI-modified
1 . An optical waveguide assembly comprising:
 a plurality of waveguides;   an amorphous silicon arrayed waveguide grating communicative with said waveguides; and,   an integrated III-V semiconductor device which communicatively outputs a laser output in cooperation with said amorphous silicon arrayed waveguide grating;   wherein, the amorphous silicon waveguide grating and III-V semiconductor device are coupled such that the amorphous silicon waveguide grating at least spectrally filters and beam splits a laser output from a lasing cavity.   
   
   
       2 . The assembly of  claim 1 , wherein said waveguide comprises an at least one a-SiN x :H layer and a single mode rib. 
   
   
       3 . The assembly of  claim 2 , wherein said single mode rib is 2 μm wide. 
   
   
       4 . The assembly of  claim 2 , wherein said single mode rib is dry etched using reactive ion etching. 
   
   
       5 . The assembly of  claim 2 , wherein said at least one a-SiN x :H layer is deposited by plasma enhanced chemical vapor deposition. 
   
   
       6 . The assembly of  claim 1 , wherein said waveguide is a buried waveguide. 
   
   
       7 . The assembly of  claim 1 , wherein said waveguide comprises a bending radius, wherein said bending radius is between about 600 μm and about 1000 μm. 
   
   
       8 . An optical waveguide assembly comprising:
 a waveguide;   an amorphous silicon arrayed waveguide grating communicative with said waveguide;   an integrated amorphous silicon waveguide grating laser which communicatively outputs a laser output responsive to said amorphous silicon arrayed waveguide grating; and   a beam splitter distinct from the amorphous silicon waveguide grating.   
   
   
       9 . The assembly of  claim 1 , further comprising an InGaAsP gain section to which the laser output is responsive. 
   
   
       10 . A method of forming an optical waveguide assembly, said method comprising:
 providing a plurality of waveguides;   an amorphous silicon arrayed waveguide grating communicative with said waveguides;   providing an integrated III-V semiconductor device which communicatively outputs a laser output in cooperation with said amorphous silicon arrayed waveguide grating; and   spectrally filtering and beam splitting a laser output from a lasing cavity using the amorphous silicon waveguide grating.   
   
   
       11 . The method of  claim 10 , wherein said method comprises providing an at least one a-SiN x :H layer and providing a single mode rib. 
   
   
       12 . The method of  claim 11 , wherein said single mode rib is 2 μm wide. 
   
   
       13 . The method of  claim 11 , wherein said single mode rib is dry etched using reactive ion etching. 
   
   
       14 . The method of  claim 11 , wherein said at least one a-SiN x :H layer is deposited by plasma enhanced chemical vapor deposition. 
   
   
       15 . The method of  claim 10 , wherein said waveguide is a buried waveguide. 
   
   
       16 . The method of  claim 10 , wherein said waveguide comprises a bending radius, wherein said bending radius is between about 600 μm and about 1000 μm. 
   
   
       17 . The method of  claim 10 , wherein said providing said amorphous silicon arrayed waveguide grating further comprises providing a splitter. 
   
   
       18 . The method of  claim 10 , further comprising providing an InGaAsP gain section to which the laser output is responsive.

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