US2009314649A1PendingUtilityA1
Precursor containing copper indium and gallium for selenide (sulfide) compound formation
Est. expiryMar 15, 2025(expired)· nominal 20-yr term from priority
Inventors:Bulent M. Basol
H10P 14/3436H10P 14/265H10P 14/203H10F 77/126Y02E10/541
56
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Claims
Abstract
The present invention relates to systems and methods for preparing metallic precursor thin films for the growth of semiconductor compounds to be used for radiation detector and solar cell fabrication. In one aspect, there is provided a method of efficiently using expensive materials necessary for the making of solar cells.
Claims
exact text as granted — not AI-modified1 - 9 . (canceled)
10 . A method of forming a Cu(In,Ga)(S,Se)2 semiconductor layer on a base comprising; depositing a first film comprising only copper on the base using a physical vapor deposition method; electroplating a layer comprising indium and gallium over the copper film, thus forming a precursor stack; and reacting the precursor stack with at least one of selenium and sulfur.
11 . The method according to claim 10 wherein the step of depositing uses sputtering.
12 . The method according to claim 11 wherein the step of electroplating the layer comprises electroplating a gallium film on the surface of the copper film and electroplating an indium film on the surface of the gallium film.
13 . The method according to claim 11 wherein the step of electroplating the layer comprises electroplating an In—Ga alloy film on the surface of the copper film.Join the waitlist — get patent alerts
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