Anti-reflective coatings using vinyl ether crosslinkers

Abstract

Novel, wet developable anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups and dissolved in a solvent system along with a crosslinker and a photoacid generator. The preferred acid functional group is a carboxylic acid, while the preferred crosslinker is a vinyl ether crosslinker. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light, the cured compositions will decrosslink, rendering them soluble in typical photoresist developing solutions (e.g., alkaline developers).

1 . A method of forming a microelectronic structure, said method comprising the steps of:
 providing a substrate having a surface;   applying a composition to said surface, said composition comprising a compound dissolved or dispersed in a solvent system, said compound being selected from the group consisting of polymers, oligomers, and mixtures thereof, said compound comprising a carboxylic acid group;   crosslinking the compound in said composition to form a layer of composition that is substantially insoluble in ethyl lactate and to yield crosslinked compounds comprising linkages having the formula   
     
       
         
         
             
             
         
       
       forming a photoresist layer on said composition; and 
       exposing said composition to light so as to decrosslink said crosslinked compound.