Methods and systems for pattern generation based on multiple forms of design data

Abstract

In a pattern generation method, properties of designs are extracted in a mask data preparation system, and the properties are propagated to a lithography write system. A pattern is generated based on fractured design data and the extracted properties. By preserving the design intent to the lithography write system, the fidelity of the pattern replication may improve.

1 . A pattern generation method, the method comprising:
 receiving fractured design data and metadata; and   generating a pattern based on the fractured design data and the metadata; wherein
 the metadata describes the design data prior to fracturing. 
   
     
     
         2 . The pattern generation method of  claim 1 , wherein the metadata is received in a data flow different from a data flow associated with the fractured polygon representation. 
     
     
         3 . The pattern generation method of  claim 1 , wherein the metadata and the fractured polygon representation are received in a bundled data flow. 
     
     
         4 . The pattern generation method of  claim 1 , wherein the metadata includes properties associated with at least one of corners and edges of the pattern. 
     
     
         5 . The pattern generation method of  claim 1 , wherein the metadata includes at least one of spatial location data, opening angle data, orientation data and isolation data associated with at least one corner of the pattern. 
     
     
         6 . An apparatus in a lithographic system, the apparatus comprising:
 means for receiving fractured design data and metadata;   means for generating a pattern based on the received fractured design data and the received metadata.