Organic compounds
Abstract
The invention relates to organic compounds having the ability to reduce or suppress the onset of skin irritation induced by extraneous cause selected from the group of 2-heptylcyclopentanone, 2-ethoxynaphthalene; 2-methoxynaphthalene; 1-methoxy-4-(prop-1-enyl)benzene; 1-(cyclopropylmethyl)-4-methoxybenzene; wherein X, Y, and R 1 to R 11 have the same meaning as given in the description. Furthermore the invention refers to compositions for topical application to the skin comprising them. It further relates to a method of reducing or suppressing the formation of skin irritation.
Claims
exact text as granted — not AI-modified1 . A topical skin care composition comprising as actives
(a) at least one compound of the formula
wherein
R is hydrogen or isopropyl;
R 1 is methyl or ethyl; and R 2 is C 1 -C 6 alkyl or C 2 -C 6 alkenyl; or
R 1 and R 2 together with the carbon atom to which they are attached form a C 5 or C 6 cycloalkyl ring; and
the dotted line together with the carbon carbon bond represents a single bond or a double bond;
(b) at least one compound of the formula
wherein Y is a C 4 -C 7 hydrocarbon residue; and
(c) a cosmetically acceptable carrier;
wherein the total amount of actives is 0.2 to 2 weight % based on the topical skin care composition.
2 . A topical skin care composition according to claim 1 comprising as actives
(a) at least one compound selected from 2-cyclohexylidene-2-phenylacetonitrile, 2-cyclopentylidene-2-phenylacetonitrile and 3-ethyl-2-phenylpent-2-enenitrile; and (b) at least one compound selected from n-hexyl salicylate, cis-3-hexen-l-yl salicylate, cyclohexylsalicylate, amylsalicylate, isobutylsalicylate, and phenethyl salicylate.
3 . A topical skin care composition comprising as actives
(a) at least one compound of the formula
wherein
R 4 is methyl or ethyl and
I) R 3 is hydrogen and R 5 is —CH 2 —O—R 6 , wherein R 6 is methyl or isopropyl; or
II) R 3 is —C(O)—R 7 , wherein R 7 is benzyl, and R 5 is —CH 2 —CH═CH 2
(b) at least one compound of the formula
wherein
R 8 is methyl, C 3 -C 4 alkyl, C 3 -C 4 alkenyl, —(CH 2 ) 2 —Ph, or —CH═CH—Ph;
X is —CH═CH—CH 2 — or —(CH 2 ) n —, wherein n is 1 or 2; and
R 9 is isobutyl or phenylethyl;
(c) a cosmetically acceptable carrier;
wherein the total amount of actives 0.2 to 2 weight % based on the topical skin care composition.
4 . A topical skin care composition according to claim 1 further comprising as actives at least one compound of the formula
wherein
R 4 is methyl or ethyl and
I) R 3 is hydrogen and R 5 is —CH 2 —O—R 6 , wherein R 6 is methyl or isopropyl; or
II) R 3 is —C(O)—R 7 , wherein R 7 is benzyl, and R 5 is —CH 2 —CH═CH 2 .
5 . A topical skin care composition according to claim 1 further comprising as actives at least one compound of the formula
wherein
R 8 is methyl, C 3 -C 4 alkyl, C 3 -C 4 alkenyl, —(CH 2 ) 2 —Ph, or —CH═CH—Ph;
X is —CH═CH—CH 2 — or —(CH 2 ) n —, wherein n is 1 or 2; and
R 9 is isobutyl or phenylethyl.
6 . A topical skin care composition comprising about 0.5 to about 3 weight % of a fragrance composition which comprises as actives at least 30 weight % based on the fragrance composition of
(a) at least one compound of the formula
wherein
R is hydrogen or isopropyl;
R 1 is methyl or ethyl; and R 2 is C 1 -C 6 alkyl or C 2 -C 6 alkenyl; or
R 1 and R 2 together with the carbon atom to which they are attached form a C 5 or C 6 cycloalkyl ring; and
the dotted line together with the carbon-carbon bond represents a single bond or a double bond; and
(b) at least one compound of the formula
wherein Y is a C 4 -C 7 hydrocarbon residue;
and the topical skin care composition comprising at least 0.2 weight % of actives based on the skin composition.
7 . A topical skin care composition according to claim 1 wherein the skin composition is a cosmetic product.
8 . A fragrance composition comprising at least 30 weight % of at least two actives selected from the group consisting of
(a) compounds of the formula
wherein
R is hydrogen or isopropyl;
R 1 is methyl or ethyl; and R 2 is C 1 -C 6 alkyl or C 2 -C 6 alkenyl; or
R 1 and R 2 together with the carbon atom to which they are attached form a C 5 or C 6 cycloalkyl ring; and
the dotted line together with the carbon carbon bond represents a single bond or a double bond;
(b) compounds of the formula
wherein Y is a C 4 -C 7 hydrocarbon residue;
(c) compounds of the formula
wherein
R 4 is methyl or ethyl and
I) R 3 is hydrogen and R 5 is —CH 2 —O—R 6 , wherein R 6 is methyl or isopropyl; or
II) R 3 is —C(O)—R 7 , wherein R 7 is benzyl, and R 5 is —CH 2 —CH═CH 2 ,
(d) compounds of the formula
wherein
R 8 is methyl, C 3 -C 4 alkyl, C 3 -C 4 alkenyl, —(CH 2 ) 2 —Ph, or —CH═CH—Ph;
X is —CH═CH—CH 2 — or —(CH 2 ) n —, wherein n is 1 or 2; and
R 9 is isobutyl or phenylethyl;
(e) compounds of the formula
wherein
R 10 is hydrogen or methyl; and
R 11 is a C 3 -C 4 alkyl, e.g. isopropyl, isobutyl or tert-butyl, and
(f) 2-heptylcyclopentanone, 2-ethoxynaphthalene, 2-methoxynaphthalene, 1-methoxy-4-(prop-1-enyl)benzene and 1-(cyclopropylmethyl)-4-methoxybenzene.
9 . A fragrance composition according to claim 8 comprising at least two actives are selected from at least two of groups (a), (b), (c), (d), (e) and (f) of compounds.
10 . A fragrance composition according to claim 8 comprising at least 30 weight % comprising at least four actives selected from groups (a), (b), (c), (d), (e) and (f) of compounds.
11 . A fragrance composition according to claim 8 comprising at least 30 weight % of at least four actives characterized in that four actives or more are selected from different groups (a), (b), (c), (d), (e) and (f) of compounds.
12 . A method for the preparation of topical skin care compositions comprising the step of including in the skin care composition at least one compound selected from the group consisting of
(a) compounds of the formula
wherein
R is hydrogen or isopropyl;
R 1 is methyl or ethyl; and R 2 is C 1 -C 6 alkyl or C 2 -C 6 alkenyl; or
R 1 and R 2 together with the carbon atom to which they are attached form a C 5 or C 6 cycloalkyl ring; and
the dotted line together with the carbon carbon bond represents a single bond or a double bond;
(b) compounds of the formula
wherein Y is a C 4 -C 7 hydrocarbon residue;
(c) compounds of the formula
wherein
R 4 is methyl or ethyl and
I) R 3 is hydrogen and R 5 is —CH 2 —O—R 6 , wherein R 6 is methyl or isopropyl; or
II) R 3 is —C(O)—R 7 , wherein R 7 is benzyl, and R 5 is —CH 2 —CH═CH 2 ,
(d) compounds of the formula
wherein
R 8 is methyl, C 3 -C 4 alkyl, C 3 -C 4 alkenyl, —(CH 2 ) 2 —Ph, or —CH═CH—Ph;
X is —CH═CH—CH 2 — or —(CH 2 ) n —, wherein n is 1 or 2; and
R 9 is isobutyl or phenylethyl;
(e) compounds of the formula
wherein
R 10 is hydrogen or methyl; and
R 11 is a C 3 -C 4 alkyl, e.g. isopropyl, isobutyl or tert-butyl, and
(f) 2-heptylcyclopentanone, 2-ethoxynaphthalene, 2-methoxynaphthalene, 1-methoxy-4-(prop-1-enyl)benzene and 1-(cyclopropylmethyl)-4-methoxybenzene.
13 . A method of reducing the onset of skin irritation by applying to the skin an effective amount of a topical skin care composition comprising at least 30 weight % of a fragrance composition containing at least two actives as defined in claim 12 , with the proviso that the topical skin care composition comprises at least 0.2 weight % of actives based on the total amount of the skin composition.
14 . A method of reducing the onset of skin irritation comprising:
(A) providing a topical skin care composition comprising at least 30 weight % of a fragrance composition containing at least two actives as defined in claim 12 , with the proviso that the topical skin care composition comprises at least 0.2 weight % of actives based on the total amount of the skin composition; and (B) topically applying to the skin an effective amount of the composition of step (A) for reducing skin irritation.
15 . A topical skin care composition according to claim 4 further comprising as actives at least one compound of the formula
wherein
R 8 is methyl, C 3 -C 4 alkyl, C 3 -C 4 alkenyl, —(CH 2 ) 2 —Ph, or —CH═CH—Ph;
X is —CH═CH—CH 2 — or —(CH 2 ) n —, wherein n is 1 or 2; and
R 9 is isobutyl or phenylethyl.Join the waitlist — get patent alerts
Track US2010063011A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.