Structure for pattern formation, method for pattern formation, and application thereof

Abstract

A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.

1 . A method for pattern formation adapted for optically forming a pattern, wherein
 a structure for pattern formation comprises: a substrate; a photocatalyst-containing layer provided on the substrate; and, provided on the photocatalyst-containing layer, a layer containing a material of which wettability is variable through photocatalytic action, and   the structure is pattern-wise exposed to vary the wettability of the surface of the structure through photocatalytic action.   
   
   
       2 . The method for pattern formation according to  claim 1 , wherein the pattern-wise exposure of the photocatalyst-containing layer is carried out by light beam exposure. 
   
   
       3 . The method for pattern formation according to  claim 1 , wherein the pattern-wise exposure of the photocatalyst-containing layer is carried out by exposure through a photomask. 
   
   
       4 . The method for pattern formation according to  claim 1 , wherein the pattern-wise exposure of the photocatalyst-containing layer is carried out while heating the structure for pattern formation. 
   
   
       5 . An element comprising the structure for pattern formation adapted for optically forming a pattern,
 wherein the structure for pattern formation further comprises: the substrate; the photocatalyst-containing layer provided on the substrate; and, provided on the photocatalyst-containing layer, the layer containing the material of which the wettability is variable through photocatalytic action upon pattern-wise exposure, and   wherein a functional layer provided on the structure for pattern formation in its areas corresponding to a pattern, of the structure for pattern formation, obtained by the pattern-wise exposure according to  claim 1 .   
   
   
       6 . An element produced by transferring a functional layer onto another substrate, the functional layer being provided on the structure for pattern formation in its areas corresponding to a pattern, of the structure for pattern formation, obtained by the pattern-wise exposure according to  claim 1 . 
   
   
       7 . A process for producing an element comprising steps of:
 providing the structure for pattern formation adapted for optically forming a pattern which comprises: the substrate; the photocatalyst-containing layer provided on the substrate; and, provided on the photocatalyst-containing layer, the layer containing the material of which the wettability is variable through photocatalytic action upon pattern-wise exposure, and   forming a functional layer provided on the structure for pattern formation in its areas corresponding to a pattern, of the structure for pattern formation, obtained by the pattern-wise exposure according to  claim 1 .   
   
   
       8 . A process for producing an element comprising a step of transferring a functional layer onto another substrate, the functional layer being provided on the structure for pattern formation in its areas corresponding to a pattern, of the structure for pattern formation, obtained by the pattern-wise exposure according to  claim 1 , whereby the functional layer is formed on the another substrate. 
   
   
       9 . The process for producing an element according to  claim 7 , comprising the steps of : forming a composition for a functional layer onto the whole surface of the structure for pattern formation; and forming a patterned functional layer on the structure for pattern formation only in its wettability-varied exposed areas by utilizing repellency of unexposed areas. 
   
   
       10 . The process for producing an element according to  claim 7 , comprising the steps of : forming a composition for a functional layer onto the whole surface of the structure for pattern formation; and forming a patterned functional layer on the structure for pattern formation by removing the functional layer in its unexposed areas to from a patterned functional layer. 
   
   
       11 . The process for producing an element according to  claim 8 , comprising the steps of : forming a composition for a functional layer onto the whole surface of the structure for pattern formation; and forming a patterned functional layer on the structure for pattern formation only in its wettability-varied exposed areas by utilizing repellency of unexposed areas. 
   
   
       12 . The process for producing an element according to  claim 8 , comprising the steps of : forming a composition for a functional layer onto the whole surface of the structure for pattern formation; and forming a patterned functional layer on the structure for pattern formation by removing the functional layer in its unexposed areas to from a patterned functional layer. 
   
   
       13 . The process for producing an element according to  claim 7 , wherein the functional layer is formed on the structure for pattern formation by coating a composition for a functional layer. 
   
   
       14 . The process for producing an element according to  claim 8 , wherein the functional layer is formed on the structure for pattern formation by coating a composition for a functional layer. 
   
   
       15 . The process for producing an element according to claim  7 , wherein the functional layer is formed on the structure for pattern formation by ejecting a composition for a functional layer through a nozzle. 
   
   
       16 . The process for producing an element according to  claim 8 , wherein the functional layer is formed on the structure for pattern formation by ejecting a composition for a functional layer through a nozzle. 
   
   
       17 . The process for producing an element according to  claims 7 , wherein the functional layer is formed on the structure for pattern formation by thermal or pressure transfer from a film coated with a composition for a functional layer. 
   
   
       18 . The process for producing an element according to  claims 8 , wherein the functional layer is formed on the structure for pattern formation by thermal or pressure transfer from a film coated with a composition for a functional layer. 
   
   
       19 . The process for producing an element according to  claim 7 , wherein the functional layer is formed on the structure for pattern formation by film formation utilizing vacuum. 
   
   
       20 . The process for producing an element according to  claim 8 , wherein the functional layer is formed on the structure for pattern formation by film formation utilizing vacuum. 
   
   
       21 . The process for producing an element according to  claim 7 , wherein the functional layer is formed on the structure for pattern formation by film formation utilizing electroless plating. 
   
   
       22 . The process for producing an element according to  claim 8 , wherein the functional layer is formed on the structure for pattern formation by film formation utilizing electroless plating.