System for supplying water vapor in semiconductor wafer treatment

Abstract

A system for supplying water vapor in a process for treatment of a semiconductor wafer, comprising a treatment chamber having an interior for receiving at least one semiconductor wafer and a water vapor dispenser. The water vapor dispenser comprises i) a hot water source, ii) a water vapor separator, iii) a first conduit fluidly connecting the hot water source to the water vapor separator, iii) a fluid control valve in the first conduit controlling the flow of fluid between the hot water source and the water vapor separator, and iv) a second conduit fluidly connecting the water vapor separator to the treatment chamber for delivery of water vapor to the interior of the treatment chamber.

1 . A system for supplying water vapor in a process for treatment of a semiconductor wafer, comprising
 a) a treatment chamber having an interior for receiving at least one semiconductor wafer; and   b) a water vapor dispenser comprising
 i) a hot water source, 
 ii) a water vapor separator, 
 iii) a first conduit fluidly connecting the hot water source to the water vapor separator, 
 iii) a fluid control valve in the first conduit controlling the flow of fluid between the hot water source and the water vapor separator, and 
 iv) a second conduit fluidly connecting the water vapor separator to the treatment chamber for delivery of water vapor to the interior of the treatment chamber. 
   
   
   
       2 . The system of  claim 1 , wherein the hot water source is capable of heating water to a temperature of from boiling to superheating. 
   
   
       3 . The system of  claim 1 , wherein the hot water source is a water heater capable of heating water to a temperature of from about 100 to about 150° C. 
   
   
       4 . The system of  claim 1 , wherein the hot water source is a water heater configured to dispense superheated fluid having less than about 30% by volume water vapor, wherein the fluid control valve is a throttling valve configured to reduce the pressure of superheated water passing through the valve, causing a portion of the water to flash to water vapor. 
   
   
       5 . The system of  claim 1 , wherein the hot water source is a water heater configured to dispense superheated fluid having less than about 5% by volume water vapor, wherein the fluid control valve is a throttling valve configured to reduce the pressure of superheated water passing through the valve, causing a portion of the water to flash to water vapor. 
   
   
       6 . The system of  claim 1 , wherein the fluid control valve is a throttling valve configured to reduce the pressure of superheated water passing through the valve, causing a portion of the water to flash to steam. 
   
   
       7 . The system of  claim 1 , wherein the water vapor separator comprises a mist eliminator. 
   
   
       8 . The system of  claim 1 , wherein the hot water source is a water heater that is the only heating component of the water vapor dispenser.