Customized z-lens design program
Abstract
Embodiments of the invention pertain to a method for producing a spectacle lens with optimal correction across the entire lens taking into account the patient's complete measured wavefront. Specific embodiments can also take into account one or more additional factors such as vertex distance, SEG height, pantoscopic tilt, and use conditions. The lens wavefront can be achieved by optimizing a corrected wavefront, where the corrected wavefront is the combined effect of the patient's measured wavefront and the lens wavefront. The optimization of the corrected wavefront can involve representing the measured wavefront and the lens wavefront on a grid. In an embodiment, the grid can lie in a plane. During the optimization, a subset of the grid can be used for the representation of the measured wavefront at a point on the grid so as to take into account the portions of the measured wavefront that contribute to the corrected wavefront at that point on the grid.
Claims
exact text as granted — not AI-modified1 . A method for wavefront optimization process comprises,
measuring raw wavefront data, considering frame fitting data selected from group comprising pupilary distance, vertex distance, pantascopic tilt, SEG height, considering patient specific data such as desired usage conditions, considering spectacle geometry such as its length and width including location of the pupil in the frame, and creating lens manufacturing instructions that is based on determining optimum wavefront prescription, wherein the optimum wavefront prescription comprises wavefront fitting and processing.
2 . The method of claim 1 , wherein the lens manufacturing instructions may include a surface map for front and/or back side of a lens, a points file for freeform lens generator for custom front and back surfaces, a refractive index profile that is created in a changeable refractive index layer, a refractive index profile that is created by ink-jet deposition, a stereolithography profile in conjunction with casting, or combination of any of the said techniques can be combined to achieve the custom lens manufacturing.
3 . The method of claim 1 , wherein the lens manufacturing instructions is applied to a lens where the wavefront is emphasized along the central optical axis and de-emphasized outside the central optical axis to produce aberration corrected single vision or progressive addition lens.
4 . The method of claim 1 , wherein the wavefront fitting and processing comprises method of determining lens wavefront.
5 . The method of claim 4 , wherein the method of determining lens wavefront comprises, measuring a patient's wavefront to create a pupil aberration, generating a plurality of corrected wavefronts, generating a function of the plurality of corrected wavefronts, determining a lens wavefront by optimizing the function of the plurality of corrected wavefronts, and producing a lens taking into account the lens wavefront.
6 . A method for determining a wavefront for a lens from a patient's measured wavefront comprises,
measuring patient's wavefront aberrations, optimizing the combined patient and lens wavefront aberrations, considering frame fitting data selected from group comprising pupilary distance, vertex distance, pantascopic tilt, SEG height, and use conditions, and producing a spectacle lens with optimal correction across the entire lens.
7 . The method of claim 6 , wherein the spectacle lens is produced by one of the methods that include a surface map for front and/or back side of a lens, a points file for freeform lens generator for custom front and back surfaces, a refractive index profile that is created in a changeable refractive index layer, a refractive index profile that is created by ink jet deposition, a stereolithography profile in conjunction with casting, or combination of any of the said techniques can be combined to achieve the custom lens manufacturing.
8 . The method of claim 6 , wherein the spectacle lens produced is a single vision or progressive addition lens and comprises wavefront that is emphasized along the central optical axis and de-emphasized outside the central optical axis.
9 . A method for determining lens wavefront comprises,
optimizing a corrected wavefront, wherein the optimization involves representing the measured wavefront and the lens wavefront on a grid, wherein the grid lies in a plane, a subset of grid is used for the representation of the measured wavefront at a point on the grid so as to take into account the portions of the measured wavefront that contribute to the corrected wavefront at that point on the grid.
10 . The method of claim 9 , wherein the corrected wavefront is the combined effect of patient's measured wavefront and the lens wavefront.
11 . The method of claim 9 , wherein the optimization involves hill climbing optimization technique such as Gaussian Least Squares Fit and Point Spread Optimization software to fit an optimal wavefront across a specified surface larger than that of the measured wavefront.
12 . The method of claim 11 , wherein the optimal wavefront across a larger specified surface involves projection from a number of points emanating in multiple directions from a nominal axis of rotation representing the center of the eye.
13 . The method of claim 12 , wherein the wavefront as projected from the center of the eye can be convolved with a weighting function across the lens to enhance or emphasize the wavefront in certain area while allowing other areas to be de-emphasized.
14 . The method of claim 13 , wherein the wavefront is best fit along a surface representing a paraxial lens representing the neutral axis of a lens, wherein the paraxial lens is fixed in space at a specified vertex distance and follows the basic lens design curvature of the chosen lens blank.
15 . The method of claim 13 , wherein the emphasized wavefront is in the central region of the lens where the distortion is reduced and the de-emphasized area is when the patient is looking off center outside the central region.
16 . The method of claim 9 , wherein the wavefront pattern is solely based upon the low order aberrations, the high order aberrations or combination of both low and high order aberrations.Cited by (0)
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