Temperature control system for semiconductor manufacturing equipment
Abstract
A temperature control system for semiconductor manufacturing equipment is disclosed, which can properly cool a process chamber adopted in the semiconductor manufacturing equipment such as a wafer etching device. The temperature control system for semiconductor manufacturing equipment includes a thermocline for cooling heat transfer fluid accommodated therein through a heat exchange with a heat exchanger and storing heat energy, a supply line for controlling the temperature of the heat transfer fluid in the thermocline through a heater and supplying the heat transfer fluid with a proper temperature to a process device, a recovery line for forwarding the heat transfer fluid having passed through the process device to the thermocline, and a bypass for forwarding a part of the heat transfer fluid passing through the recovery line to the supply line through the heater.
Claims
exact text as granted — not AI-modified1 . A temperature control system for semiconductor manufacturing equipment, comprising:
a thermocline for cooling heat transfer fluid accommodated therein through a heat exchange with a heat exchanger and storing heat energy; a supply line for controlling the temperature of the heat transfer fluid in the thermocline through a heater and supplying the heat transfer fluid with a proper temperature to a process device; a recovery line for forwarding the heat transfer fluid having passed through the process device to the thermocline; and a bypass for forwarding a part of the heat transfer fluid passing through the recovery line to the supply line through the heater.
2 . A temperature control system for semiconductor manufacturing equipment, comprising:
a circulation line for supplying heat transfer fluid to a process device and then recovering the supplied heat transfer fluid; a thermocline for cooling the heat transfer fluid accommodated therein through a heat exchange with a heat exchanger, storing heat energy, receiving a part of the heat transfer fluid circulating through the circulation line, and then supplying the part of the heat transfer fluid accommodated therein to the circulation line; and a heater for controlling a temperature of the heat transfer fluid being supplied to the process device through the circulation line at a proper temperature level.
3 . The temperature control system of claim 1 , further comprising a proportional control valve for controlling a flow of the heat transfer fluid so that a flow rate of the heat transfer fluid flowing into the thermocline through the process device and a flow rate of the heat transfer fluid being discharged to be supplied from the thermocline to the process device substantially coincide with each other.
4 . The temperature control system of claim 1 , wherein the thermocline comprises a phase change material (PCM) pipe for storing thermal energy using a PCM.
5 . The temperature control system of claim 1 , further comprising a plurality of process devices connected to the thermocline so that the thermocline supplies the heat transfer fluid to the respective process devices.
6 . The temperature control system of claim 1 , further comprising an auxiliary bypass for supplying to the heater the part of the heat transfer fluid being supplied to the process device through the heater.
7 . The temperature control system of claim 2 , further comprising a proportional control valve for controlling a flow of the heat transfer fluid so that a flow rate of the heat transfer fluid flowing into the thermocline through the process device and a flow rate of the heat transfer fluid being discharged to be supplied from the thermocline to the process device substantially coincide with each other.
8 . The temperature control system of claim 2 , wherein the thermocline comprises a phase change material (PCM) pipe for storing thermal energy using a PCM.
9 . The temperature control system of claim 2 , further comprising a plurality of process devices connected to the thermocline so that the thermocline supplies the heat transfer fluid to the respective process devices.
10 . The temperature control system of claim 2 , further comprising an auxiliary bypass for supplying to the heater the part of the heat transfer fluid being supplied to the process device through the heater.Join the waitlist — get patent alerts
Track US2010206519A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.