High-throughput local oxidation nanolithographic process

Abstract

In a lithographic process suitable for use in the manufacture of electronic components, oxidative reactions are employed to reproducibly fabricate patterns having micro- or nano-scale dimensions. An electrically-conductive template is fabricated to have a nanometer-scale sharp edge and describe a pattern having a micron-scale length. The oxidative reaction is mediated by a water meniscus connecting the sharp edge of the template and an oxidizable substrate. One suitable substrate is graphene. The template can be controllably positioned using a light lever method.

1 . A method of reproducibly forming a pattern having a nanoscale dimension in an oxidizable substrate, wherein said method employs a wafer having an electrically-conductive raised template integral therewith, the template having an electrically-conductive edge that is distal from the wafer, has a width that is less than about 30 nm and describes a pattern having a length of at least 1000 nm along one dimension of the pattern, said method comprising the steps of:
 in a gaseous media having a relative humidity of at least 20%, positioning the template with the sharp edge proximate the oxidizable substrate so as to form a meniscus of liquid water that fluidly and electrically connects the sharp edge to the substrate; and   applying a voltage across the template and the substrate so as to oxidize at least some of a portion of the substrate that is in contact with the meniscus.