Dielectric coatings and use in capacitors

Abstract

A coated substrate product is described comprising a substrate and a dielectric coating material comprising carbon, hydrogen, silicon, and oxygen. According to the method, the substrate is processed by plasma cleaning the surface and then depositing a dielectric coating by a suitable plasma process. The coating may contain one or more layers. The substrate may be a rigid material or a thin film or foil. The coated products of this invention have superior dielectric material properties and utility as substrates for the manufacture of rolled or parallel plate capacitors with high energy densities.

1 .- 12 . (canceled) 
     
     
         13 . A dielectric-coated substrate, comprising a first layer of dielectric coating material comprising carbon, hydrogen, silicon, and oxygen and having a dielectric strength ranging from about 200 V/μm to about 2400 V/μm. 
     
     
         14 . The dielectric-coated substrate of  claim 13 , wherein the dielectric coating material layer has a dielectric strength ranging from about 600 V/μm to about 2400 V/μm. 
     
     
         15 . The dielectric-coated substrate of  claim 13 , wherein the dielectric coating material layer has a dissipation factor less than about 2%. 
     
     
         16 . The dielectric-coated substrate of  claim 13 , wherein the substrate comprises a film or foil having an exposed metallic margin. 
     
     
         17 . The dielectric-coated substrate of  claim 16 , wherein the substrate is coated on two sides thereof. 
     
     
         18 . The dielectric-coated substrate of  claim 13 , further comprising a second dielectric coating material layer disposed adjacent to the first layer. 
     
     
         19 . A capacitor comprising the dielectric-coated substrate of  claim 13 .