Hafnium or zirconium oxide Coating

Abstract

The invention concerns an optical coating ( 3, 3 ′), having a high refractive index and good optical properties (i.e., low absorption and scatter) and limited internal stresses in a spectral range extending from the visible to the near UV range (i.e., up to a wavelength of 220 nm). The coating ( 3, 3 ′) according to the invention consists of a hafnium- or zirconium-containing oxide Hf x Si y O z or Zr x Si y O z , containing an silicon fraction (y) between 1 at. % and 10 at. %, especially between 1.5 at. % and 3 at. %.

1 . Coating ( 3 ,  3 ′) from a hafnium- or zirconium-containing oxide, characterized by the fact that the hafnium- or zirconium-containing oxide contains a silicon fraction (y) between 1 at. % and 10 at. %, especially between 1.5 at. % and 3 at. %. 
     
     
         2 . Coating ( 3 ,  3 ′) according to  claim 1 , characterized by the fact that the coating ( 3 ,  3 ′) has a composition Hf x Si y O z  or Zr x Si y O z  with an O fraction (z) between 65 at. % and 68 at. % and a silicon fraction (y) between 1 at. % and 10 at. %. 
     
     
         3 . Coating ( 3 ,  3 ′) according to  claim 2 , characterized by the fact that the coating ( 3 ,  3 ′) has a composition Hf x Si y O 66.7  or Zr x Si y O 66.66 . 
     
     
         4 . Coating according to  claim 3 , characterized by the fact that the coating ( 3 ,  3 ′) has a composition Zr 30.83 Si 2.5 O 66.66 . 
     
     
         5 . Optical component ( 1 ) with substrate ( 2 ) and a coating ( 3 ) applies to the substrate ( 2 ) from a hafnium- or zirconium-containing oxide (Hf x Si y O z  or Zr x Si y O z ), characterized by the fact that the hafnium- or zirconium-containing oxide (Hf x Si y O z  or Zr x Si y O z ) contains a silicon fraction (y) between 1 at. % and 10 at. %, especially between 1.5 at. % and 3 at. %. 
     
     
         6 . Optical component ( 1 ) according to  claim 5 , characterized by the fact that the 0 fraction (z) lies between 65 at. % and 68 at. %. 
     
     
         7 . Optical component ( 1 ′) with substrate ( 2 ) and a multilayer system ( 5 ) applied to substrate ( 2 ), in which the multilayer system ( 5 ) includes at least one layer ( 3 ′) from a hafnium- or zirconium-containing oxide (Hf x Si y O z  or Zr x Si y O z ), characterized by the fact that the hafnium- or zirconium-containing oxide (Hf x Si y O z  or Zr x Si y O z ) contains a silicon fraction (y) between 1 at. % and 10 at. %. 
     
     
         8 . Optical component ( 1 ) according to  claim 7 , characterized by the fact that the 0 fraction (z) lies between 65 at. % and 68 at. %. 
     
     
         9 . Optical component ( 1 ,  1 ′) according to one of the  claims 5  to  8 , characterized by the fact that substrate ( 2 ) consists of quartz. 
     
     
         10 . Optical component ( 1 ,  1 ′) according to one of the preceding claims, characterized by the fact that the layer stress of layer ( 3 ) or the multilayer system is less than 800 MPa, preferably less than 300 MPa, and more preferably less than 100 MPa. 
     
     
         11 . Method of production of coating according to one of the  claims 1  to  4 , characterized by the fact that the coating ( 3 ) from the hafnium- or zirconium-containing oxide (Hf x Si y O z  or Zr x Si y O z ) is produced by magnetron sputtering. 
     
     
         12 . Method for production of an optical component ( 1 ,  1 ′) according to one of the  claims 5  to  10 , characterized by the fact that the coating ( 3 ) from the hafnium- or zirconium-containing oxide (Hf x Si y O z  or Zr x Si y O z ) is applied on substrate ( 2 ) by means of magnetron sputtering. 
     
     
         13 . Method according to  claim 11  or  12 , characterized by the fact that production of the coating ( 3 ) occurs by reactive co-magnetron sputtering of Hr of Zr and Si. 
     
     
         14 . Method according to  claim 11  or  12 , characterized by the fact that production of the coating ( 3 ) occurs by reactive co-magnetron sputtering of HfSi or ZrSi and Si. 
     
     
         15 . Method according to  claim 11  or  12 , characterized by the fact that production of the coating ( 3 ) occurs by reactive co-magnetron sputtering of Hf x Si y O z  or Zr x Si y O z  and Si. 
     
     
         16 . Method according to  claim 11  or  12 , characterized by the fact that production of the coating ( 3 ) occurs by reactive magnetron sputtering, using an Hf- or Zr- and Si-containing compound target. 
     
     
         17 . Method according to  claim 11  or  12 , characterized by the fact that production of the coating ( 3 ) occurs by partially reactive magnetron sputtering, using a conducting Hf x Si y O z  or Zr x Si y O z  compound target. 
     
     
         18 . Method according to one of the  claims 11  to  17 , characterized by the fact that the reactive or partially reactive magnetron sputtering is accompanied by reactive in situ plasma treatment. 
     
     
         19 . Method according to one of the  claims 11  to  18 , characterized by the fact that the Si fraction is set so that the layer ( 3 ) has minimal extinction with simultaneously low layer stress and high refractive index. 
     
     
         20 . Use of an optical component ( 1 ) according to one of the  claims 5  to  10 , characterized by the fact that the optical component ( 1 ) is used as a laser mirror. 
     
     
         21 . Use of an optical component ( 1 ) according to one of the  claims 5  to  10 , characterized by the fact that the optical component ( 1 ) is used as an edge filter.