US2010288729A1PendingUtilityA1

Methods for Manufacturing a Microstructure

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Assignee: MICRONIT MICROFLUIDICS BVPriority: Oct 9, 2007Filed: Oct 3, 2008Published: Nov 18, 2010
Est. expiryOct 9, 2027(~1.2 yrs left)· nominal 20-yr term from priority
B81B 2203/0376B81C 1/00119B81C 1/00103B81C 2201/0146
38
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Claims

Abstract

Methods for manufacturing a microstructure, wherein use is made of a powder blasting and/or etching and a single mask layer with openings and structures of varying dimensions, wherein the mask layer at least at one given point in time has been wholly worn away within at least one region by mask erosion while the microstructure is not yet wholly realized. Use can be made of a combination of ‘vertical’ erosion, i.e. parallel to the thickness direction and ‘horizontal’ erosion, i.e. perpendicularly of the thickness direction, of the mask layer. The horizontal mask erosion occurs at the edges of the mask structure.

Claims

exact text as granted — not AI-modified
1 - 10 . (canceled) 
     
     
         11 . A method for manufacturing a microstructure, wherein use is made of powder blasting and a single mask layer with openings and structures of varying dimensions, and wherein the mask layer at least at one given point in time is wholly worn away within at least one region by mask erosion while the microstructure is not yet wholly realized. 
     
     
         12 . The method as claimed in  claim 11 , wherein the wearing away is at least partly the result of powder blasting. 
     
     
         13 . The method as claimed in  claim 11 , wherein the wearing away is at least partly the result of etching. 
     
     
         14 . The method as claimed in  claim 11 , wherein after the at least one given point in time and the microstructure is fully realized, use is made of powder blasting. 
     
     
         15 . The method as claimed in  claim 11 , wherein after the at least one given point in time and the microstructure is fully realized, use is made of etching. 
     
     
         16 . A method for manufacturing a microstructure, wherein use is made of etching and a single mask layer with openings and structures of varying dimensions, and wherein the mask layer at least at one given point in time is wholly worn away within at least one region by mask erosion while the microstructure is not yet wholly realized. 
     
     
         17 . The method as claimed in  claim 16 , wherein the wearing away is at least partly the result of etching. 
     
     
         18 . The method as claimed in  claim 16 , wherein the wearing away is at least partly the result of powder blasting. 
     
     
         19 . The method as claimed in  claim 16 , wherein after the at least one given point in time and the microstructure is fully realized, use is made of etching. 
     
     
         20 . The method as claimed in  claim 16 , wherein after the at least one given point in time and the microstructure is fully realized, use is made of powder blasting.

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