Electro-deposited passivation coatings for patterned media

Abstract

A method of fabricating a patterned magnetic recording disk is described. The method may include electrodepositing a protection layer on the magnetic recording layer of the disk.

1 . A method of fabricating a magnetic recording disk, comprising:
 providing a magnetic recording layer having a pattern of raised areas and recessed areas formed thereon;   providing a mask layer on the raised areas of the magnetic recording layer;   electrodepositing a first protection layer on the magnetic recording layer;   removing the mask layer; and   depositing a second protection layer above the first protection layer.   
     
     
         2 . The method of  claim 1 , wherein eletrodepositing comprises electroplating. 
     
     
         3 . The method of  claim 2 , wherein electroplating comprises depositing material of the first protection layer only in the recessed areas of the magnetic recording layer. 
     
     
         4 . The method of  claim 3 , the first protection layer comprises a metal. 
     
     
         5 . The method of  claim 3 , wherein the first protection layer comprises aluminum. 
     
     
         6 . The method of  claim 3 , wherein the first protection layer comprises a silicate. 
     
     
         7 . The method of  claim 3 , wherein the first protection layer comprises an insulator. 
     
     
         8 . The method of  claim 7 , further comprising baking the first protection layer after electrodepositing and before depositing the second protection layer. 
     
     
         9 . The method of  claim 3 , where the first protection layer comprises an aluminate. 
     
     
         10 . The method of  claim 3 , wherein the first protection layer comprises a material selected from a group consisting of aluminum, gold, copper, chromium, ruthenium, platinum and rhodium. 
     
     
         11 . The method of  claim 3 , wherein after electroplating the method further comprises:
 rinsing the first protection layer; and   annealing the first protection layer before removing the masking layer.   
     
     
         12 . The method of  claim 11 , wherein the masking layer comprises a non-conductive material. 
     
     
         13 . The method of  claim 3 , wherein the first protection layer has a thickness less than 1 micron. 
     
     
         14 . The method of  claim 3 , further comprising electrodepositing one or more additional films on the first protection layer before depositing the second protection layer. 
     
     
         15 . The method of  claim 1 ,
 wherein eletrodepositing comprises electroless plating the first protection layer on the mask layer and the recessed areas of the magnetic recording layer; and   wherein removing the mask layer comprises, removing the mask layer to lift off overlaying first protection layer.   
     
     
         16 . A magnetic recording disk, comprising:
 a magnetic recording layer having a pattern of raised areas and recessed areas;   an electrodeposited first protection layer disposed only on the recessed areas; and   a second protection layer disposed on the electrodeposited first protection layer and the raised areas of the magnetic recording layer.   
     
     
         17 . The magnetic recording disk of  claim 16 , wherein the electrodeposited layer comprises a metal. 
     
     
         18 . The magnetic recording disk of  claim 16 , wherein the electrodeposited layer comprises a silicate. 
     
     
         19 . The magnetic recording disk of  claim 16 , wherein the electrodeposited layer comprises an aluminate. 
     
     
         20 . The magnetic recording disk of  claim 16 , wherein the electrodeposited layer comprises a material selected from a group consisting of aluminum, gold, copper, chromium, ruthenium, platinum and rhodium. 
     
     
         21 . The magnetic recording disk of  claim 16 , wherein the electrodeposited layer comprises a material having a crystalline structure. 
     
     
         22 . The magnetic recording disk of  claim 16 , wherein the electrodeposited layer comprises a material having an amorphous structure.