US2010330220A1PendingUtilityA1
Directed assembly of three-dimensional structures with micron-scale features
Est. expiryJun 17, 2023(expired)· nominal 20-yr term from priority
C09D 11/03B33Y 70/00C09D 11/00
56
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Claims
Abstract
Polyelectrolyte inks comprising a solvent, a cationic polyelectrolyte dissolved in the solvent, and an anionic polyelectrolyte dissolved in the solvent, are described. The concentration of at least one of the polyelectrolytes in the solvent is in a semidilute regime.
Claims
exact text as granted — not AI-modified1 . An apparatus for the fabrication of microstructures, the apparatus comprising:
(1) a nozzle comprising an opening having a diameter of at most 10 microns; (2) a stage below the nozzle for supporting a substrate; (3) a micropositioner operably connected to at least one of the nozzle and the stage; and (4) an ink reservoir in fluid communication with the nozzle.
2 . The apparatus of claim 1 , further comprising a pressure dispensing system operably connected to the ink reservoir.
3 . The apparatus of claim 1 , wherein the micropositioner is a computer-controlled micropositioner.
4 . The apparatus of claim 1 , wherein the opening of the nozzle has a diameter of at most 1 micron.
5 . The apparatus of claim 1 , wherein the opening of the nozzle has a diameter of at least 0.1 micron.
6 . The apparatus of claim 1 , further comprising a plurality of nozzles.
7 . The apparatus of claim 6 , further comprising a plurality of substrates on the stage.
8 . The apparatus of claim 1 , further comprising a substrate on the stage, the substrate comprising a deposition bath.
9 . The apparatus of claim 8 , wherein the deposition bath is configured to induce gelation of an ink flowed through the nozzle.
10 . The apparatus of claim 8 , wherein the deposition bath comprises an aqueous solvent.
11 . The apparatus of claim 8 , wherein the deposition bath comprises an apolar solvent.
12 . The apparatus of claim 11 , wherein the apolar solvent comprises an alcohol.
13 . The apparatus of claim 12 , wherein the deposition bath comprises a mixture of isopropyl alcohol and water.Join the waitlist — get patent alerts
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