Method and electrode for defining and replicating structures in conducting materials
Abstract
The present invention concerns an electrochemical pattern replication method, ECPR, and a construction of a conductive electrode for production of applications involving micro and nano structures. An etching or plating pattern, which is defined by a conductive electrode, a master electrode, is replicated on an electrically conductive material, a substrate. The master electrode is put in close contact with the substrate and the etching/plating pattern is directly transferred onto the substrate by using a contact etching/plating process. The contact etching/plating process is performed in local etching/plating cells, that are formed in closed or open cavities between the master electrode and the substrate.
Claims
exact text as granted — not AI-modified1 - 54 . (canceled)
55 . An electrode suitable for an etching or plating process, comprising a counter electrode and a pattern defining structure of an electro chemical etching or plating cell are integrated into a master electrode, wherein the counter electrode is a conducting electrode layer or a flexible conducting foil, and the pattern defining structure is an insulating patter layer being applied on said counter electrode.
56 . The electrode according to claim 55 , wherein the counter electrode is inert.
57 . The electrode according to claim 55 , wherein a flexible elastomer layer is applied on the insulting pattern layer.
58 . The electrode according to claim 55 , wherein the counter electrode is applied on a mechanical support layer.
59 . The electrode according to claim 58 , wherein a conductive elastomer layer is applied between the counter electrode and the mechanical support layer.
60 . The electrode according to claim 57 , wherein an intermediate metal layer is applied between the insulating pattern layer and the flexible elastomer layer.
61 . The electrode according to claim 55 , wherein the flexible conducting foil is made of titanium.
62 . The electrode according to claim 61 , wherein the master electrode comprises two counter electrodes with a sacrificial photo-resist layer applied in between and that contact parts of the master electrode, structures of the insulating pattern layer, are electrochemically anodised to form an isolating layer.
63 . An apparatus according to claim 62 , comprising a master electrode and means for creating conformable contact between the master electrode and a substrate.
64 . The apparatus according to claim 63 , wherein said means are one or more elastomer layers in the master electrode construction.
65 . The apparatus according to claim 63 , wherein said means are combined with a conformable membrane.
66 . The apparatus according to claim 63 , wherein there are conducting means for electrical connection to the master electrode on an outer side and electrical connection to the substrate on a contact side.
67 . The apparatus according to claim 63 , wherein the master electrode is fixed in the apparatus by an applied vacuum.
68 . The apparatus according to claim 66 , wherein said conducting means for electrical connections is a conducting piece applied on the outer side of the master electrode.
69 . The apparatus according to claim 63 , wherein the master electrode is fixed in the apparatus by a pressure against a conducting piece, said pressure exerted by the conformable membrane and/or a piston.
70 . The apparatus according to claim 69 , wherein said pressure when applied with the conformable membrane is combined with a reservoir containing gas or liquid.
71 . The apparatus according to claim 63 , wherein gas bubbles are eliminated from an electrolyte solution and/or the reservoir by the use of an externally applied vacuum, ultrasound or a combination of vacuum and ultrasound.Cited by (0)
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