Method for producing laminate, barrier film substrate, device and optical member

Abstract

A method for producing a laminate having a structure of an organic layer and an inorganic layer laminated thereon, which comprises polymerizing a mixture that contains a monomer of the following formula (1) wherein m is 2 and a monomer of the following formula (1) wherein m is 3 or more, thereby forming the organic layer: wherein R 1 represents a hydrogen atom or a methyl group; and L represents an m-valent linking group.

1 . A method for producing a laminate having a structure of an organic layer and an inorganic layer laminated thereon, which comprises polymerizing a mixture that contains a monomer of formula (1) wherein m is 2, and a monomer of formula (1) wherein m is 3 or more, thereby forming the organic layer: 
       
         
           
           
               
               
           
         
         wherein R 1  represents a hydrogen atom or a methyl group; and L represents an m-valent linking group. 
       
     
     
         2 . The method for producing a laminate according to  claim 1 , wherein the total blend ratio of the monomer of formula (1) wherein m is 2 and the monomer of formula (1) wherein m is 3 is at least 75% by mass. 
     
     
         3 . The method for producing a laminate according to  claim 1 , which comprises polymerizing a mixture that contains a monomer of the formula (1) wherein m is 2 and a monomer of the formula (1) wherein m is 3, thereby forming the organic layer. 
     
     
         4 . The method for producing a laminate according to  claim 3 , wherein a blend ratio of the monomer of formula (1) wherein m is 2 is from 60 to 80% by mass, and a blend ratio of the monomer of formula (1) wherein m is 3 is from 20 to 40% by mass. 
     
     
         5 . The method for producing a laminate according to  claim 1 , which comprises polymerizing a mixture that contains a monomer of the formula (1) wherein m is 2 and a monomer of the formula (1) wherein m is 4 or more, thereby forming the organic layer. 
     
     
         6 . The method for producing a laminate according to  claim 5 , wherein a blend ratio of the monomer of formula (1) wherein m is 2 is from 60 to 80% by mass, and a blend ratio of the monomer of formula (1) wherein m is 4 or more is from 20 to 40% by mass. 
     
     
         7 . The method for producing a laminate according to  claim 1 , which comprises polymerizing a mixture that contains a monomer of the formula (1) wherein m is 2, a monomer of the formula (1) wherein m is 3, and a monomer of formula (1) wherein m is 4 or more, thereby forming the organic layer. 
     
     
         8 . The method for producing a laminate according to  claim 7 , wherein a total blend ratio of the monomer of formula (1) wherein m is 2 and the monomer of formula (1) wherein m is 3 is from 75 to 95% by mass, and a blend ratio of the monomer of formula (1) wherein m is 4 or more is from 5 to 25% by mass. 
     
     
         9 . The method for producing a laminate according to  claim 1 , wherein L in formula (1) is a linking group not containing an oxygen-containing functional group. 
     
     
         10 . The method for producing a laminate according to  claim 1 , wherein the organic layer is formed through flash vapor evaporation and the monomer mixture is polymerized in a vacuum of at most 100 Pa. 
     
     
         11 . The method for producing a laminate according to  claim 1 , wherein the barrier layer is formed by laminating the organic layer and an inorganic layer all the time in a vacuum of at most 100 Pa. 
     
     
         12 . The method for producing a laminate according to  claim 1 , which comprises polymerizing the monomer mixture on a support through UV polymerization at an energy radiation level of at least 2 J/cm 2  in a vacuum of at most 100 Pa. 
     
     
         13 . The method for producing a laminate according to  claim 1 , wherein the organic layer is formed in a clean room. 
     
     
         14 . The method for producing a laminate according to  claim 1 , wherein the thickness of the inorganic layer is from 20 to 60 nm.