US2011140304A1PendingUtilityA1
Imprint lithography template
Est. expiryDec 10, 2029(~3.4 yrs left)· nominal 20-yr term from priority
G03F 7/0002B82Y 40/00B82Y 10/00B29C 59/002H10P 76/2041
48
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Claims
Abstract
Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.
Claims
exact text as granted — not AI-modified1 . A nano imprint lithography template, comprising:
a body having a first surface and a second surface; an active area positioned on the second surface of the body; an inner channel positioned adjacent to the active area, the inner channel having an aperture and a port, the aperture forming a recessed region in the second surface of the body and the port extending from the aperture to the first surface of the body; and, an outer channel positioned at a distance from the active area.
2 . The nano imprint lithography template of claim 1 , where the active area includes a mold having a patterned area.
3 . The nano imprint lithography template of claim 1 , wherein the recessed region in the second surface surrounds the active area of the body.
4 . The nano imprint lithography template of claim 1 , wherein the channel is rectangular.
5 . The nano imprint lithography template of claim 1 , wherein the port of the inner channel is constructed to provide the inner channel in fluid communication with a process gas supply.
6 . The nano imprint lithography template of claim 1 , wherein the aperture is constructed to provide the inner channel in fluid communication with atmosphere adjacent to the second surface of the body.
7 . The nano imprint lithography template of claim 1 , wherein the outer channel forming a recessed region includes a port and an aperture, the port of the outer channel constructed to provide the outer channel in fluid communication with a waste container, the aperture of the outer channel constructed to provide the outer channel in fluid communication with atmosphere adjacent to the second surface of the body.
8 . The nano imprint lithography template of claim 1 , wherein the distance between the active area and the outer channel is constructed such that the outer channel evacuates fluid and simultaneously confines fluid within a circumference of the outer channel during an imprint lithography process.
9 . The nano imprint lithography template of claim 1 , further comprising at least one hole extending through the body from the first surface to the second surface.
10 . A method, comprising:
providing fluid in an inner channel of an imprint lithography template, the inner channel positioned adjacent to an active area of the template, the inner channel having an aperture and a port, the port constructed to provide the inner channel in fluid communication with a process gas supply and the aperture constructed to provide the inner channel in fluid communication with atmosphere adjacent to the second surface of the body; and, confining the fluid between the active area of the template and a substrate positioned in superimposition with the template.
11 . The method of claim 10 , wherein confining includes evacuating fluid through an outer channel, the outer channel positioned at a distance from the active area of the template, wherein the distance between the active area and the outer channel is constructed such that the outer channel evacuates fluid and simultaneously confines fluid within a circumference of the outer channel during an imprint lithography process.
12 . The method of claim 10 , further comprising, directing fluid through an outer channel of the template to a waste container.
13 . The method of claim 10 , further comprising, directing fluid through an outer channel of the template to atmospheric conditions.
14 . The method of claim 10 , further comprising pulsing fluid through at least one hole positioned adjacent to the active area of the template.
15 . The method of claim 10 , further comprising sequentially pulsing fluid through a first portion of holes and a second portion of holes positioned adjacent to the active area of the template.
16 . The method of claim 10 , wherein providing fluid in an inner channel of an imprint lithography template further includes sequentially pulsing fluid through the inner channel and a first portion of holes positioned adjacent to the active area of the template.
17 . The method of claim 16 , further comprising, evacuating fluid through a second portion of holes positioned adjacent to the active area of the template.
18 . The method of claim 10 , further comprising evacuating fluid through holes positioned adjacent to the active area of the template.
19 . An imprint lithography template, comprising:
a body having a first surface and a second surface; an active area positioned on the second surface of the body; a plurality of holes distributed around the active area, each hole extending from the second surface of the body to the first surface of the body.
20 . The imprint lithography template of claim 19 , wherein the plurality of holes surround the active area of the template.Join the waitlist — get patent alerts
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