US2011168555A1PendingUtilityA1

Rotary sputtering target and apparatus for manufacture

Assignee: SOLERAS LTDPriority: Sep 21, 2005Filed: Mar 21, 2011Published: Jul 14, 2011
Est. expirySep 21, 2025(expired)· nominal 20-yr term from priority
H01J 37/34C23C 14/3407H01J 37/342H01J 37/3491
38
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Claims

Abstract

The process that is the subject of this invention is a method of making a rotary sputtering target having the steps of providing a cylinder of sputtering target material having an adhesion-wetting layer on its inside surface; providing a stainless steel sputtering target backing tube having an outside diameter smaller than the sputtering target material inside diameter, the backing tube having an adhesion-wetting layer on its outside surface; welding an upper and lower stainless steel retaining ring to the backing tube adjacent to the sputtering target material so that the target material is in compression and the backing tube in tension; and introducing molten bonding material into the annulus between the backing tube and the sputtering target material. The apparatus that is the subject of the present invention is a rotary sputtering target apparatus having a cylinder of sputtering target material; a backing tube having a smaller outside diameter than the inside diameter of the sputtering target material; and bonding material disposed between the target material and backing tube, the bonding material bonding them together.

Claims

exact text as granted — not AI-modified
1 . A rotary sputtering target apparatus comprising:
 a backing tube having an outside diameter smaller than a sputtering target material inside diameter;   at least one cylinder of sputtering target material coaxially stacked onto the backing tube, the tube occupying the center of the individual cylinder; and   bonding material in an annulus between the backing tube and the sputtering target material.   
     
     
         2 . The apparatus of  claim 1 , the target material cylinders having an adhesion-wetting layer on its inside surface. 
     
     
         3 . The apparatus of  claim 1 , the backing tube having an adhesion-wetting layer on its outside surface. 
     
     
         4 . The apparatus of  claim 2 , wherein the adhesion-wetting layer is applied by vacuum deposition onto the sputtering target material inside surface. 
     
     
         5 . The apparatus of  claim 3 , wherein the adhesion-wetting layer is applied by vacuum deposition onto the sputtering target material outside surface. 
     
     
         6 . The apparatus of  claim 1  with the backing tube is in tension and the target material stack is in compression. 
     
     
         7 . The apparatus of  claim 1  further comprising:
 an upper retaining ring secured on one end of the backing tube and adjacent to the sputtering target material; and 
 a lower retaining ring secured on an end of the backing tube opposite the upper retaining ring and adjacent to the sputtering target material. 
 
     
     
         8 . The apparatus of  claim 7 , wherein the upper and lower retaining rings are made of stainless steel. 
     
     
         9 . The apparatus of  claim 1 , wherein the backing tube is made of stainless steel. 
     
     
         10 . An apparatus for making a rotary sputtering target comprising:
 a backing tube having an outside diameter smaller than a sputtering target material inside diameter;   at least one cylinder of sputtering target material and up to multiple cylindrical segments of target material stacked upon one another coaxially stacked onto the backing tube, the tube occupying the center of the cylinder; and   bonding material disposed in the annulus between the backing tube and the sputtering target material.   
     
     
         11 . The apparatus of  claim 10  with the backing tube in tension and the target material stack in compression. 
     
     
         12 . The apparatus of  claim 10  further comprising:
 an upper retaining ring secured on one end of the backing tube and adjacent to the sputtering target material; and 
 a lower retaining ring secured on an end of the backing tube opposite the upper retaining ring and adjacent to the sputtering target material. 
 
     
     
         13 . The apparatus of  claim 12 , wherein the upper and lower retaining rings are made of stainless steel. 
     
     
         14 . The apparatus of  claim 10 , wherein the backing tube is made of stainless steel. 
     
     
         15 . The apparatus of  claim 10  further comprising:
 a top ring insert disposed between the backing tube and a mold pipe above the upper retaining ring; and 
 a bottom ring insert disposed between the backing tube and a mold pipe below the lower retaining ring. 
 
     
     
         16 . The apparatus of  claim 15  further comprising a vacuum port enabling the inner volume of the mold pipe to be under vacuum during the pouring of the molten bonding material into the annulus between the backing tube and target material.

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