Vapor Deposition of a Layer

Abstract

A method of depositing a layer onto a substrate, comprising heating an evaporator to a temperature capable of completely evaporating the evaporant to be deposited, dispensing into the evaporator one or more quantized units of the evaporant where the evaporant is completely vaporized, providing an area vapor dispenser having a plurality of apertures, and directing the vaporized evaporant from the evaporator to the area vapor dispenser so that the evaporant is dispensed through the apertures to deposit the layer on the substrate.

1 - 17 . (canceled) 
     
     
         18 . Apparatus for depositing a layer onto a substrate, comprising:
 a) a platform for mounting the substrate;   b) an area vapor dispenser positioned relative to the substrate platform and having a plurality of apertures;   c) a heated evaporator capable of completely evaporating the evaporant to be deposited;   d) a material dispenser for dispensing into the evaporator quantized units of the evaporant so as to completely vaporize such evaporant; and   e) means for directing the vaporized evaporant from the evaporator to the area vapor dispenser so that the evaporant is dispensed through the apertures to deposit the layer on the substrate.   
     
     
         19 . The apparatus according to  claim 18 , wherein the area vapor dispenser defines apertures through which the vaporized evaporant is delivered onto the substrate to form the layer. 
     
     
         20 . The apparatus according to  claim 18 , further containing a control valve between the area vapor dispenser and the heated evaporator. 
     
     
         21 . An OLED device fabricated using the apparatus of  claim 18 . 
     
     
         22 . A tandem OLED device fabricated using the apparatus of  claim 18 .