US2011213113A1PendingUtilityA1
Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film
Est. expirySep 1, 2026(~0.1 yrs left)· nominal 20-yr term from priority
Inventors:Andrew JacksonVimal SharmaE. Bradley EdwardsJanet BoggsVicki HedrickStephan BrandstadterJohn ChienEdward C. NormanRobert J. KaufmanBruno AmeduriGeorge Kostov
C11D 3/349C07C 311/09C11D 3/0031C07F 9/091C11D 3/32C07C 317/18C07C 69/653C08F 220/24C11D 1/004
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Claims
Abstract
R F -compositions including surfactants, foam stabilizers, monomers, polymers, urethanes, intermediates, metal complexes, phosphate esters as well as telomerization methods are provided.
Claims
exact text as granted — not AI-modified1 . A surfactant composition comprising R F (R T ) n Q s , wherein:
the R F group comprises at least one —CF 3 group; the R T group comprises —CF 2 CH 2 CH(CF 3 )—; n is at least one; and the Qs group is at least one atom of the periodic table of elements, wherein at least a portion of the R F and R T groups are hydrophobic relative to the Qs group, and at least a portion of the Q s group is hydrophilic relative to the R F and R T groups.
2 . The surfactant of claim 1 wherein the R F group is one of —C 3 F 6 or —C 3 F 7 .
3 . (canceled)
4 . (canceled)
5 . The surfactant of claim 1 wherein the R T group comprises —CH 2 CF 2 CH 2 CF 2 CH 2 CH(CF 3 )—.
6 . (canceled)
7 . (canceled)
8 . (canceled)
9 . (canceled)
10 . A foam stabilizer composition comprising R F (R T ) n Q FS , wherein:
the R F group comprises at least one —CF 3 group; the R T group comprises —CF 2 CH 2 CH(CF 3 )—; n is at least 1; and the Q FS group is at least one atom of the periodic table of elements, wherein at least a portion of the R F and R T groups are hydrophobic relative to the Q FS group, and at least a portion of the Q FS group is hydrophilic relative to the R F and R T groups.
11 . The foam stabilizer of claim 10 wherein the R F group is one of —C 3 F 6 or —C 3 F 7 .
12 . (canceled)
13 . (canceled)
14 . The foam stabilizer of claim 10 wherein the R T group comprises —CH 2 CF 2 CH 2 CF 2 CH 2 CH(CF 3 )—.
15 . (canceled)
16 . (canceled)
17 . (canceled)
18 . (canceled)
19 . A monomer comprising R F (R T ) n Q M wherein:
the R F group comprises at least one —CF 3 group; the R T group comprises —CF 2 CH 2 CH(CF 3 )—; n is at least 1; and the Q M group is at least one atom of the periodic table of elements.
20 . The monomer of claim 19 wherein the R F group is one of —C 3 F 6 or —C 3 F 7 .
21 . (canceled)
22 . (canceled)
23 . The monomer of claim 19 wherein the R T group comprises —CH 2 CF 2 CH 2 CF 2 CH 2 CH(CF 3 )—.
24 . (canceled)
25 . (canceled)
26 . (canceled)
27 . (canceled)
28 . A polymer comprising R F (R T ) n Q MU , wherein:
the R F group comprises at least one —CF 3 group; the R T group comprises —CF 2 CH 2 CH(CF 3 )—; n is at least 1; and the Q MU group is a portion of a polymer chain backbone.
29 . The polymer of claim 28 wherein the R F group is one of —C 3 F 6 or —C 3 F 7 .
30 . (canceled)
31 . (canceled)
32 . The polymer of claim 28 wherein the R T group comprises —CH 2 CF 2 CH 2 CF 2 CH 2 CH(CF 3 )—.
33 . (canceled)
34 . (canceled)
35 . (canceled)
36 . (canceled)
37 . A urethane comprising R F (R T ) n Qu, wherein:
the R F group comprises at least one —CF 3 group; the R T group comprises —CF 2 CH 2 CH(CF 3 )—; n is at least 1; and the Q U group is at least one atom of the periodic table of elements.
38 . The urethane of claim 37 wherein the RF group is one of —C 3 F 6 or —C 3 F 7 .
39 . (canceled)
40 . (canceled)
41 . The urethane of claim 37 wherein the R T group comprises —CH 2 CF 2 CH 2 CF 2 CH 2 CH(CF 3 )—.
42 . (canceled)
43 . (canceled)
44 . (canceled)
45 . (canceled)
46 . A glycol comprising R F (R T ) n Q H , wherein:
the R F group comprises at least one —CF 3 group; the R T group comprises —CF 2 CH 2 CH(CF 3 )—; n is at least 1; and the Q H group is a portion of a glycol chain backbone.
47 . The glycol of claim 46 wherein the R F group is one of —C 3 F 6 or —C 3 F 7 .
48 . (canceled)
49 . (canceled)
50 . (canceled)
51 . (canceled)
52 . (canceled)
53 . (canceled)
54 . (canceled)
55 . A metal complex comprising R F (R T ) n Q MC , wherein:
the R F group comprises at least one —CF 3 group; the R T group comprises —CF 2 CH 2 CH(CF 3 )—; n is at least 1; and the Q MC group comprises a charged group configured to complex one or more metal ions.
56 . The metal complex of claim 55 wherein the R F group is one of —C 3 F 6 or —C 3 F 7 .
57 . (canceled)
58 . (canceled)
59 . The metal complex of claim 55 wherein the R T group comprises —CH 2 CF 2 CH 2 CF 2 CH 2 CH(CF 3 )—.
60 . (canceled)
61 . (canceled)
62 . (canceled)
63 . (canceled)
64 . A phosphate ester composition comprising R F (R T ) n Q PE , wherein:
the R F group comprises at least two —CF 3 groups; the R T group comprises a group having at least two carbons; n is at least 1; and the Q PE group is a portion of a phosphate ester.
65 . The phosphate ester of claim 64 wherein the R F group is one of —C 3 F 6 or —C 3 F 7 .
66 . (canceled)
67 . (canceled)
68 . The phosphate ester of claim 64 wherein the R T group comprises —CH 2 CF 2 CH 2 CF 2 CH 2 CH(CF 3 )—.
69 . (canceled)
70 . (canceled)
71 . (canceled)
72 . (canceled)
73 . A composition comprising R F (R T ) n Qg, wherein:
the R F group has a carbon amount greater than C5 and at least one terminal and at least one pendant —CX 3 group, with X being one or both of H and F; the R T group comprises —CH 2 CX 2 —; n is greater than 1; and the Qg group is at least one atom of the periodic table of elements.
74 . The composition of claim 73 wherein the R F group has a carbon amount between C5 and C17.
75 . The composition of claim 73 wherein the R T group comprises —CH 2 CH 2 —.
76 . The composition of claim 73 wherein the R T group comprises —CH 2 CF 2 —.
77 . The composition of claim 73 wherein the R F group comprises (CF 3 ) 2 CFCH 2 CH(CF 3 )—.
78 . (canceled)
79 . (canceled)
80 . (canceled)
81 . (canceled)
82 . (canceled)
83 . (canceled)
84 . (canceled)
85 . (canceled)
86 . (canceled)
87 . (canceled)
88 . (canceled)
89 . The composition of claim 73 wherein the R F group comprises (CF 3 ) 2 CF(CH 2 CF 2 ) l —, l being from 1 to 2.
90 . The composition of claim 73 wherein the R F group comprises (CF 3 ) 2 CF(CH 2 C(CF 3 )H) m —, m being from 1 to 3.
91 . The composition of claim 73 wherein the R F group comprises (CF 3 ) 2 CF(CH 2 CF 2 ) l (CH 2 C(CF 3 )H) m —, l being from 1 to 2 and m being from 1 to 3.
92 . A telomerization process comprising exposing a taxogen to a telogen to form a telomer, the taxogen being one of or more of VDF, TFP, and ethylene, and the telogen comprises one of C 3 F 6 (R T ) n X or C 3 F 7 (R T ) n X, wherein X is a halogen, R T is one or both of —CH 2 CF 2 — and —CH 2 C(CF 3 )H—, and n is 1 to 4.
93 . The telomerization process of claim 92 wherein the taxogen is VDF and the telogen is (CF 3 ) 2 CFCH 2 CH(CF 3 )I.
94 . The telomerization process of claim 92 wherein the taxogen is TFP and the telogen is (CF 3 ) 2 CF(CH 2 CF 2 ) n I, wherein n is 1 or 2.
95 . (canceled)
96 . The telomerization process of claim 92 wherein the taxogen is TFP and the telogen is (CF 3 ) 2 CFCH 2 CF 2 CH 2 CF 2 (CH 2 CH(CF 3 )) m I, wherein m is 1 or 2.
97 . (canceled)
98 . The telomerization process of claim 92 wherein the taxogen is ethylene and the telogen is (CF 3 ) 2 CFCH 2 CF 2 CH 2 CF 2 CH 2 CH(CF 3 )CH 2 CH(CF 3 )CH 2 CH(CF 3 )I.
99 . (canceled)
100 . A telomerization process comprising exposing a taxogen to a telogen to form a telomer, the taxogen comprising an olefin having greater than two carbon atoms, and the telogen comprising at least five carbon atoms and having at least two —CF 3 groups.
101 . The telomerization process of claim 100 wherein the taxogen is one of ethylene, VDF, TFP, VDF, 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pent-1-ene and/or 6,7,7,7-tetrafluoro-6-(trifluoromethyl)hept-1-ene.Join the waitlist — get patent alerts
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