Laminating device

Abstract

A laminating arrangement comprising: a laminating roller; a radiating element adapted to radiate energy therefrom towards the laminating roller; a temperature detecting arrangement, adapted to detect the temperature at the surface of the laminating roller; and a processor adapted to receive a signal from the temperature detecting arrangement device and to control the intensity of radiation emitted by the radiating element, wherein: a maximum warm-up rate is defined; and during a warm-up phase of the laminating arrangement, the rate of increase in temperature at the surface of the laminating roller is determined by the processor, and the intensity of radiation emitted by the radiating element is increased if the rate of increase of temperature is less than the maximum warm-up rate, and is decreased if the rate of increase of temperature is greater than the maximum warm-up rate.

1 . A laminating arrangement comprising:
 a laminating roller;   a radiating element adapted to radiate energy therefrom towards the laminating roller;   a temperature detecting arrangement, adapted to detect the temperature at a surface of the laminating roller; and   a processor adapted to receive a signal from the temperature detecting arrangement and to control the intensity of radiation emitted by the radiating element, wherein:   a maximum warm-up rate is defined; and   during a warm-up phase of the laminating arrangement, the rate of increase in temperature at the surface of the laminating roller is determined by the processor, and the intensity of radiation emitted by the radiating element is increased if the rate of increase of temperature is less than the maximum warm-up rate, and is decreased if the rate of increase of temperature is greater than the maximum warm-up rate.   
     
     
         2 . A laminating arrangement according to  claim 1 , wherein an operating temperature is defined, being the temperature at which the laminating roller is to be maintained during laminating operations, and a maximum temperature is also defined, wherein, during the warm-up phase, the temperature of the laminating roller is increased to the maximum temperature, and wherein the maximum temperature is at least 25° C. higher than the operating temperature. 
     
     
         3 . A laminating arrangement according to  claim 2 , wherein the maximum temperature is at least 30° C. higher than the operating temperature. 
     
     
         4 . A laminating arrangement according to  claim 3 , wherein the maximum temperature is at least 35° C. higher than the operating temperature. 
     
     
         5 . A laminating arrangement according to  claim 1 , wherein a lag time is defined, and wherein, following a change in intensity of radiation emitted by the radiating element, no further change in intensity may occur until the lag time has expired. 
     
     
         6 . A laminating arrangement according to  claim 5 , wherein the lag time is at least substantially as long as a time taken for the laminating roller to complete a revolution at a rate of rotation used during laminating operations. 
     
     
         7 . A laminating arrangement according to  claim 5 , wherein the lag time is less than approximately a time taken for the laminating roller to form two complete revolutions at a rotation rate employed during laminating operations. 
     
     
         8 . A laminating arrangement according to  claim 1 , wherein the laminating roller is rotated whenever the radiating element is activated. 
     
     
         9 . A laminating arrangement according to  claim 1 , wherein, during an operation phase of the laminating arrangement, which follows the warm-up phase, the intensity of energy radiated from the radiating element is controlled, in accordance with the detected temperature of the surface of the laminating roller, to maintain the surface of the laminating roller at or near an operating temperature thereof. 
     
     
         10 . A laminating arrangement according to  claim 9 , wherein a plurality of high temperature bands are defined above the operating temperature, and wherein the intensity of radiation emitted by the radiating element is controlled in dependence of the high temperature band in which the detected temperature of the surface of the laminating roller falls. 
     
     
         11 . A laminating arrangement according to  claim 10 , wherein one or more low-temperature bands are defined below the operating temperature and wherein the intensity of the radiation emitted by the radiating element is controlled in accordance with the low temperature band in which the detected temperature of the surface of the laminating rollers falls. 
     
     
         12 . A laminating arrangement according to  claim 1 , wherein one or more fans are provided, the fans being positioned to direct a stream of air across the surface of the laminating roller to cool the laminating roller. 
     
     
         13 . A laminating arrangement according to  claim 12 , wherein the rate of rotation of the one or more fans is controlled in accordance with the detected temperature at the surface of the laminating roller. 
     
     
         14 . A laminating arrangement according to  claim 12 , configured so that, after passing over the surface of the laminating roller, air blown by the one or more fans is directed towards an exit point of the laminating roller. 
     
     
         15 . (canceled) 
     
     
         16 . A laminating arrangement according to  claim 6 , wherein the lag time is less than approximately a time taken for the laminating roller to form two complete revolutions at the rotation rate employed during laminating operations. 
     
     
         17 . A laminating arrangement according to  claim 13 , configured so that, after passing over the surface of the laminating roller, air blown by the one or more fans is directed towards an exit point of the laminating roller.