Method for manufacturing optical disc master and method for manufacturing optical disc

Abstract

An apparatus for manufacturing an optical disc master, having (a) a turntable upon which is received a disc having a resist layer composed of a resist material, the resist material comprising an incomplete oxide of a transition metal on a substrate, the oxygen content of the incomplete oxide being smaller than the oxygen content of the stoichiometric composition corresponding to a valence of the transition metal, which increases the absorption of ultraviolet rays and visible light rays, the resist material being an amorphous inorganic material containing an oxide; and (b) an exposure system operatively configured to selectively expose the resist layer to ultraviolet rays or visible light.

1 . An apparatus for manufacturing an optical disc master, comprising:
 a turntable upon which is received a disc having a resist layer composed of a resist material, the resist material comprising an incomplete oxide of a transition metal on a substrate, the oxygen content of the incomplete oxide being smaller than the oxygen content of the stoichiometric composition corresponding to a valence of the transition metal, which increases the absorption of ultraviolet rays and visible light rays, the resist material being an amorphous inorganic material containing an oxide; and   an exposure system operatively configured to selectively expose the resist layer to ultraviolet rays or visible light.   
     
     
         2 . The apparatus of  claim 1 , wherein the exposure system is operatively configured to expose the resist layer to a light beam having an irradiation power that is less than an irradiation threshold power at which exposure of the resist starts. 
     
     
         3 . An apparatus for manufacturing an optical disc master, comprising:
 a turntable upon which is received a disc having a resist layer composed of a resist material, the resist material comprising an incomplete oxide of a transition metal on a substrate, the oxygen content of the incomplete oxide being smaller than the oxygen content of the stoichiometric composition corresponding to a valence of the transition metal, which increases the absorption of ultraviolet rays and visible light rays, the resist material being an amorphous inorganic material containing an oxide;   a light source;   a light source control unit operatively configured to control the light source, and   a lens system which configures light from the light source as a light beam which is directed onto the disc;   wherein,
 the apparatus selectively exposes the resist layer to ultraviolet rays or visible light. 
   
     
     
         4 . The apparatus of  claim 3 , wherein the exposure system is operatively configured to expose the resist layer to a light beam having an irradiation power that is less than an irradiation threshold power at which exposure of the resist starts. 
     
     
         5 . The apparatus of  claim 3 , further comprising:
 a collimator lens through which light from the light source travels;   a beam splitter operatively positioned and configured to split light from the collimator lens into a first beam and a second beam;   an objective lens operatively configured and positioned to focus the first beam onto the disc;   a split photo detector operatively positioned and configured to receive via the light from beam splitter light which has reflected from the disc;   a converging lens between the beam splitter and the split photo detector; and   a focus actuator operatively configured to adjust the position of the objective lens relative to the turntable,   wherein,
 the split photo detector is configured to generate a focus error signal based on a comparison of the second beam and the reflected light, and 
 the focus actuator is configured to adjust the position of the objective lens in accordance with the focus error signal. 
   
     
     
         6 . The apparatus of  claim 3 , wherein, the light source is a laser.