Imprint method using a mold and process for producing structure using an imprint apparatus

Abstract

In order to alleviate or suppress curing of a photocurable resin material in an area in which the curing of the photocurable resin material is not intended, exposure of the photocurable resin material to light is suppressed through a non-pattern portion at which a light-blocking member is provided by means of a mold having an imprint pattern portion and the non-pattern portion or is suppressed by disposing a light-blocking member so as not to irradiate the photocurable resin material with light not via the mold.

1 . An imprint method, comprising:
 providing a substrate having a first a photocurable resin material and a mold having an imprint pattern so as to be opposed to each other;   changing, in a first processing area on the substrate, a shape of the first photocurable resin material into a shape such that the imprint pattern of the mold is inverted;   curing the first photocurable resin material in the first processing area by exposure to exposure light;   separating the cured first photocurable resin material and the mold;   providing, in a second processing area on the substrate which does not overlap with the first processing area, a second photocurable resin material on the substrate and the mold so as to be opposed to each other;   changing a shape of the second photocurable resin material into the shape such that the imprint pattern of the mold is inverted;   curing the second photocurable resin material in the second processing area by the exposure to exposure light while light-blocking a side surface of the mold with a light-blocking member provided on the mold so that the cured first photocurable resin material in the first processing area is prevented from being exposed again to the exposure light which passes through an inside of the mold and leaks out from the side surface of the mold; and   separating the cured second photocurable resin material and the mold.   
     
     
         2 . The method according to  claim 1 , wherein when the first photocurable resin material in the first processing area is changed in shape into the shape such that the imprint pattern of the mold is inverted, and then is cured,
 the first photocurable resin material in the first processing area is cured by the exposure to the exposure light while preventing the first photocurable resin material, flowing to an outside of the first processing area, from being cured.   
     
     
         3 . The method according to  claim 1 , wherein while preventing the second processing area from being exposed to the exposure light, the first photocurable resin material in the first processing area is changed in shape into the shape such that the imprint pattern of the mold is inverted, and then is cured. 
     
     
         4 . The method according to  claim 1 , wherein the first and second photocurable resin materials are applied onto the substrate in the first and second processing areas, respectively. 
     
     
         5 . The method according to  claim 1 , wherein the first and second photocurable resin materials are collectively applied onto a surface of the substrate including the first and second processing areas. 
     
     
         6 . The method according to  claim 1 , wherein the mold has three surfaces including a processing surface on which the imprint pattern is formed, a back surface opposite from the processing surface, and a surface which is provided between the processing surface and the back surface and in an area other than an area in which the processing surface is formed, and
 wherein the three surfaces provide a projection structure.   
     
     
         7 . The method according to  claim 1 , wherein the imprint method is repeated to provide, on the substrate, a plurality of transfer areas onto which the imprint pattern of the mold is transferred, and then an uncured resin material which is dispersed and remains at a plurality of portions each between adjacent transfer areas of the plurality of transfer areas is removed. 
     
     
         8 . A process for producing a structure, the process comprising:
 applying a photocurable resin material as a member to be processed onto a substrate; and   forming a resin layer having an imprint pattern by curing the photocurable resin material using light with an imprint apparatus comprising:
 a mold comprising a processing side having an imprint pattern, a back side opposite from the processing side, and a non-pattern portion at which the imprint pattern is not provided; and 
 an exposure light source, 
 wherein the mold further comprises a light-blocking member disposed at the non-pattern portion so as to decrease an amount of light with which the member to be processed is irradiated through the non-pattern portion. 
   
     
     
         9 . A process for producing a structure, the process comprising:
 applying a photocurable resin material as a member to be processed onto a substrate;   forming a resin layer having an imprint pattern by curing the photocurable resin material using light with an imprint apparatus comprising:
 a mold comprising a processing side having an imprint pattern, a back side opposite from the processing side, and a non-pattern portion at which the imprint pattern is not provided; and 
 an exposure light source, 
 wherein the mold further comprises a light-blocking member disposed at the non-pattern portion so as to decrease an amount of light with which the member to be processed is irradiated through the non-pattern portion; 
   etching the substrate by using the resin layer having the imprint pattern as a mask; and   removing the resin layer remaining on the substrate after the etching.   
     
     
         10 . The process according to  claim 9 , wherein an uncured resin material is removed before the etching. 
     
     
         11 . A process for producing a structure, the process comprising:
 preparing an imprint apparatus comprising:
 a mold comprising a processing side having an imprint pattern, a back side opposite from the processing side, and a non-pattern portion at which the imprint pattern is not provided; and 
 an exposure light source, 
 wherein the mold further comprises a light-blocking member disposed at the non-pattern portion so as to decrease an amount of light with which the member to be processed is irradiated through the non-pattern portion; and 
   curing a specific portion of photocurable resin material located in a processing area to effect transfer of a pattern formed on a processing side of a mold.