Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties

Abstract

A coating process comprises forming a patterned material layer on a substrate using a self-segregating polymeric composition comprising a polymeric photoresistive material and an antireflective coating material contained in a single solution. When depositing this solution on a substrate and removing the solvent, the two materials self-segregate into two layers. This produces a coated substrate having a uniaxial bilayer coating oriented in a direction orthogonal to the substrate with a top photoresistive coating layer and a bottom antireflective coating layer. Pattern-wise exposing the coated substrate to imaging radiation and contacting the coated substrate with a developer, produces the patterned material layer. Any optional top coat material and a portion of the photoresist layer can be simultaneously removed from the coated substrate to form a patterned photoresist layer on the substrate.

1 - 20 . (canceled) 
     
     
         21 . A self-segregating polymeric composition of matter comprising a polymeric photoresist material and a polymeric antireflective material. 
     
     
         22 . The composition of  claim 21  further comprising at least one of an optional photoacid generator, thermal acid generator, base quencher, or surfactant. 
     
     
         23 . The composition of  claim 21  wherein said polymeric antireflective material comprises a silicon polymer. 
       
         
           
           
               
               
           
         
       
       where (SiO 1.5 ) comprises a polysilsesquioxane polymer backbone, R 1  and R 2  independently comprise a linear, branched, or cyclic alkylene group of 1 to about 10 carbons, A comprises either hydrogen, methoxy-, ethoxy- or other alkoxy-, halogen or an ester group, B comprises hydroxy-, carboxy- or a carboxamido-up and is independently located in the 2-, 3- or 4-positions of the benzene ring, C comprises a nonaromatic moiety comprising: 
       
         
           
           
               
               
           
         
       
       where D and E independently comprise hydrogen, hydroxy-, acetoxy-groups, alkylalkoxy- or alkylacetoxy-groups or D and E can form a cyclic epoxide, the molar fractions x, y and z independently comprise a value from 0 to about 0.8 and the sum of x, y and z equals 1. 
     
     
         24 . The composition of  claim 21  wherein said polymeric antireflective material comprises an amide polymer: 
       
         
           
           
               
               
           
         
       
       where R 3  comprises a linear, branched, or cyclic alkylene group of 1 to about 10 carbons, G comprises hydrogen, hydroxy-, acetoxy-, methoxy-, ethoxy- or other alkoxy-, halogen, ester, carboxy- or a carboxamido-group, J comprises alkyl, alkoxy-, or up to about 6 carbon atom carboalkoxy or alkoxycarbonyl esters, lactone or anhydride moieties, the molar fractions x, y and z independently comprise a value from 0 to about 0.5 and the sum of x, y and z equals 1. the amide group comprises an organic amidic group: 
       
         
           
           
               
               
           
         
       
       where R can be methyl, ethyl, phenyl or vinyl and R′ and R″ can be independently hydrogen, alkyl or aryl group. 
     
     
         25 - 30 . (canceled) 
     
     
         31 . In the composition of  claim 23  where C comprises a nonaromatic moiety comprising: 
       
         
           
           
               
               
           
         
       
       where D and E independently comprise hydrogen, hydroxy-, acetoxy-groups, alkylalkoxy- or alkylacetoxy-groups, D and E can form a cyclic epoxide, the molar fractions x, y and z independently comprise a value from 0 to about 0.8 and the sum of x, y and z equals 1,
 each of said alkyl or alkoxy-groups comprise groups having up to about 5 carbon atoms and include branched chain and straight chain alkyl or alkoxy-groups. 
 
     
     
         32 . In the composition of  claim 24  where the amide group comprises an organic amidic group: 
       
         
           
           
               
               
           
         
       
       where R can be methyl, ethyl, phenyl or vinyl and R′ and R″ can be independently hydrogen, alkyl or aryl,
 said alkyl comprises a group having up to about 5 carbon atoms including branched chain and straight chain alkyl groups and said aryl comprises a group having up to about 14 ring carbon atoms. 
 
       
         
           
           
               
               
           
         
       
       where D and E independently comprise hydrogen, hydroxy-, acetoxy-groups, alkylalkoxy- or alkylacetoxy-groups, D and E can form a cyclic epoxide, the molar fractions x, y and z independently comprise a value from 0 to about 0.8 and the sum of x, y and z equals 1, each of said alkyl or alkoxy-groups comprise groups having up to about 5 carbon atoms and include branched chain and straight chain alkyl or alkoxy-groups.