US2011301313A1PendingUtilityA1

Imprint product and method for producing the same

Assignee: SUNAGA TADAHIROPriority: Feb 27, 2009Filed: Feb 25, 2010Published: Dec 8, 2011
Est. expiryFeb 27, 2029(~2.6 yrs left)· nominal 20-yr term from priority
C08G 2261/3324C08G 61/08G03F 7/0002B82Y 10/00B82Y 40/00C08G 2261/418C08L 65/00B29C 59/005C08G 2261/146G02B 3/0031H10P 76/2041
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Claims

Abstract

Provided is an imprint product, which is for transcribing a fine pattern of a mold surface and which contains a fluorine-containing cyclic olefin polymer containing repeating unit represented by formula (1) and having a fluorine atom content rate of 40% to 75% by mass.

Claims

exact text as granted — not AI-modified
1 . An imprint product on which a fine pattern of a mold surface is transcribed, wherein the imprint product is comprised of a fluorine-containing cyclic olefin polymer containing a repeating structural unit represented by formula (1) and having a fluorine atom content rate of 40% to 75% by mass: 
       
         
           
           
               
               
           
         
         wherein in the formula (1), at least one of R 1  to R 4  represents fluorine, a fluorine-containing C1-C10 alkyl, a fluorine-containing C1-C10 alkoxy, or a fluorine-containing C2-C10 alkoxyalkyl; when R 1  to R 4  represent groups containing no fluorine, R 1  to R 4  are each selected from hydrogen, a C1-C10 alkyl, a C1-C10 alkoxy, and a C2-C10 alkoxyalkyl; each of R 1  to R 4  may be identical with or different from the others; and R 1  to R 4  may be joined together to form a cyclic structure. 
       
     
     
         2 . The imprint product as set forth in  claim 1 , wherein said fluorine-containing cyclic olefin polymer has the variation in the storage modulus or loss modulus thereof obtained by dynamic mechanical analysis by tensile mode at a frequency of 1 Hz and a rate of temperature increase of 3° C./min, which lies in a region of −1 MPa/° C. to 0 MPa/° C. to the changes in temperature in a range of temperature which is not less than the glass transition temperature. 
     
     
         3 . The imprint product as set forth in  claim 2 , wherein said the region of variation in the storage modulus or loss modulus of said fluorine-containing cyclic olefin polymer in the range of temperature which is not less than the glass transition temperature, lies in a storage modulus region or loss modulus region of 0.1 MPa or more. 
     
     
         4 . The imprint product as set forth in  claim 1 , wherein said fluorine-containing cyclic olefin polymer is composed of a repeating structural unit [A] represented by said formula (1) and a repeating structural unit [B] represented by formula (2), with the molar ratio of the structural units being [A]/[B]=95/5 to 25/75, and has a fluorine atom content rate of 40% to 75% by mass: 
       
         
           
           
               
               
           
         
         wherein in the formula (2), at least one of R 5  to R 5  represents fluorine, a fluorine-containing C1-C10 alkyl, a fluorine-containing C1-C10 alkoxy, or a fluorine-containing C2-C10 alkoxyalkyl; when R 5  to R 8  represent groups containing no fluorine, R 5  to R 8  are each selected from hydrogen, a C1-C10 alkyl, a C1-C10 alkoxy, and a C2-C10 alkoxyalkyl; each of R 5  to R 8  may be identical with or different from the others; R 5  to R 8  may be joined together to form a cyclic structure; and n represents an integer of 1 or 2. 
       
     
     
         5 . A method for producing the imprint product using a fluorine-containing cyclic olefin polymer as set forth in  claim 1 , comprising:
 bringing a solution containing said fluorine-containing cyclic olefin polymer and an organic solvent into contact with a mold having a fine pattern on the surface and evaporating the solvent to transcribe the pattern of the mold.   
     
     
         6 . A method for producing the imprint product on which a fine pattern of a mold surface is transcribed as set forth in  claim 1 , comprising:
 applying a solution containing said fluorine-containing cyclic olefin polymer and an organic solvent on the surface of a mold having a fine pattern, and   evaporating the solvent from said solution.   
     
     
         7 . A method for producing the imprint product on which a fine pattern of a mold surface is transcribed as set forth in  claim 1 , comprising:
 pressing the surface of a film containing said fluorine-containing cyclic olefin polymer with the surface of a mold having a fine pattern.   
     
     
         8 . A method for producing a cured product by using the imprint product as set forth in  claim 1  as a mold, comprising:
 bringing the surface of said imprint product having a fine pattern into contact with a photocurable monomer composition; 
 curing said photocurable monomer composition by light irradiation to obtain a cured product; and 
 releasing said cured product from said imprint product. 
 
     
     
         9 . A resin composition for pattern transcription for obtaining an imprint product on which a fine pattern of a mold surface is transcribed, comprising a fluorine-containing cyclic olefin polymer containing a repeating structural unit represented by formula (1) and having a fluorine atom content rate of 40% to 75% by mass: 
       
         
           
           
               
               
           
         
         wherein in the formula (1), at least one of R 1  to R 4  represents fluorine, a fluorine-containing C1-C10 alkyl, a fluorine-containing C1-C10 alkoxy, or a fluorine-containing C2-C10 alkoxyalkyl; when R 1  to R 4  represent groups containing no fluorine, R 1  to R 4  are each selected from hydrogen, a C1-C10 alkyl, a C1-C10 alkoxy, and a C2-C10 alkoxyalkyl; each of R 1  to R 4  may be identical with or different from the others; and R 1  to R 4  may be joined together to form a cyclic structure. 
       
     
     
         10 . The resin composition for pattern transcription as set forth in  claim 9 , wherein said fluorine-containing cyclic olefin polymer has the variation in the storage modulus or loss modulus thereof which lies in a region of −1 MPa/° C. to 0 MPa/° C. to the changes in temperature in a range of temperature which is not less than the glass transition temperature. 
     
     
         11 . The resin composition for pattern transfer as set forth in  claim 10 , wherein said the region of variation in the storage modulus or loss modulus of said fluorine-containing cyclic olefin polymer in the region of temperature which is not less than the glass transition temperature, lies in a storage modulus region or loss modulus region of 0.1 MPa or more. 
     
     
         12 . The resin composition for pattern transcription as set forth in  claim 9 , wherein said fluorine-containing cyclic olefin polymer is composed of a repeating structural unit [A] represented by said formula (1) and a repeating structural unit [B] represented by formula (2), with the molar ratio of the structural units being [A]/[B]=95/5 to 25/75, and has a fluorine atom content rate of 40% to 75% by mass: 
       
         
           
           
               
               
           
         
         wherein in the formula (2), at least one of R 5  to R 8  represents fluorine, a fluorine-containing C1-C10 alkyl, a fluorine-containing C1-C10 alkoxy, or a fluorine-containing C2-C10 alkoxyalkyl; when R 5  to R 8  represent groups containing no fluorine, R 5  to R 8  are each selected from hydrogen, a C1-C10 alkyl, a C1-C10 alkoxy, and a C2-C10 alkoxyalkyl; each of R 5  to R 8  may be identical with or different from the others; R 5  to R 8  may be joined together to form a cyclic structure; and n represents an integer of 1 or 2.

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