Apparatus for Sub-Wavelength Near-Field Focusing of Electromagnetic Waves
Abstract
Planar sub-wavelength structures provide superlensing, i.e., electromagnetic focusing beyond the diffraction limit. The planar structures use diffraction to force the input field to converge to a spot on the focal plane. The sub-wavelength patterned structures manipulate the output wave in such a manner as to form a sub-wavelength focus in the near field. In some examples, the sub-wavelength structures may be linear grating-like structures that can focus electromagnetic radiation to lines of arbitrarily small sub-wavelength dimension, or two dimensional grating-like structures and Bessel (azimuthally symmetric) structures that can focus to spots of arbitrarily small sub-wavelength dimensions. The particular pattern for the sub-wavelength structures may be derived from the desired focus. Some examples describe sub-wavelength structures that have been implemented to focus microwave radiation to sub-wavelength dimensions in the near field.
Claims
exact text as granted — not AI-modified1 . A device for focusing an incident electromagnetic plane wave having a frequency of between 10 3 and 10 15 Hertz, the device comprising a ground plane having a plurality of parallel slots cut therein selectively positioned to focus the plane wave in the near field focal plane into spots which have a maximum diameter less than the wavelength of the plane wave.
2 . The device of claim 1 , wherein the ground plane is a metallic screen.
3 . The device of claim 1 , wherein the plurality of slots comprises a central slot and a pair of lateral slots, at least one on either side of the central slot, each slot having a length of between 0.95λ and 1.05λ.
4 . The device of claim 1 , wherein the arrangement of slots is selected such that inductive and capacitive slots are adjacent one another.
5 . The device of claim 1 , wherein the frequency is between 100 Hz and 300 GHz.
6 . The device of claim 1 , wherein the frequency is between 300 GHz and 3 THz.
7 . A method of focusing electromagnetic waves into spots in the near-field plane, comprising directing an incident electromagnet plane wave towards a ground plane, the ground plane having a plurality of parallel slots cut therein.
8 . The method of claim 7 wherein the ground plane is a metallic screen.
9 . The method of claim 7 characterized in that each of the plurality of slots comprises a central slot and a pair of lateral slots, one on either side of the central slot, each slot having a length of between 0.95λ and 1.05λ.
10 . An imaging device for receiving an incident optical radiation and producing an image from the incident optical radiation, the imaging device comprising:
a planar structure having a sub-wavelength pattern that under illumination by the incident optical radiation forms the image at a near-field focal plane, located at a distance, L, from the planar structure, where the image has a resolution below, λ, and where L is below λ.
11 . The imaging device of claim 10 , wherein λ is between 0.8-1000 μm.
12 . The imaging device of claim 10 , wherein λ is between 400-800 nm.
13 . The imaging device of claim 10 , wherein λ is between 400-200 nm.
14 . The imaging device of claim 10 , wherein the sub-wavelength pattern is of a plurality of parallel slots.
15 . The imaging device of claim 14 , wherein, across the sub-wavelength pattern, adjacent slots differ in slot height.Cited by (0)
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