Resist composition, method of forming resist pattern, novel compound, and acid generator

Abstract

A compound represented by general formula (b1); an acid generator including the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) including a compound represented by general formula (b1), wherein R 1 represents a hydrogen atom, a linear, branched or cyclic alkyl group of 1 to 10 carbon atoms or a heterocyclic group of 1 to 10 carbon atoms; R 2 represents a linear or branched alkyl group of 1 to 10 carbon atoms; x represents an integer of 0 to 6; n represents an integer of 0 to 3; and X − represents an anion.

1 . A resist composition comprising a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure,
 the acid-generator component (B) comprising an acid generator (B1) comprised of a compound represented by general formula (b1) shown below:   
       
         
           
           
               
               
           
         
       
       wherein R 1  represents a hydrogen atom, a linear, branched or cyclic alkyl group of 1 to 10 carbon atoms or a heterocyclic group of 1 to 10 carbon atoms; R 2  represents a linear or branched alkyl group of 1 to 10 carbon atoms; x represents an integer of 0 to 6; n represents an integer of 0 to 3; and X −  represents an anion. 
     
     
         2 . The resist composition according to  claim 1 , wherein X −  in general formula (b1) is at least one anion selected from the group consisting of compounds represented by any one of general formulas (1) to (4) shown below: 
       
         
           
           
               
               
           
         
       
       wherein each X 0  independently represents a hydrocarbon group of 1 to 30 carbon atoms which may have a substituent; Q 1  represents a single bond or a divalent linking group containing a carbonyl group; each p independently represents an integer of 0 to 3; Q 2  represents a single bond or an alkylene group; X 10  represents a hydrocarbon group of 1 to 30 carbon atoms which may have a substituent; Q 3  represents a single bond or a divalent linking group; Y 10  represents —C(═O)— or —SO 2 —; Y 11  represents an alkyl group of 1 to 10 carbon atoms which may have a substituent or a fluorinated alkyl group of 1 to 10 carbon atoms which may have a substituent; Y 12  represents a cyclic alkyl group of 4 to 20 carbon atoms which may have an oxygen atom (═O) as a substituent; and q represents 0 or 1. 
     
     
         3 . The resist composition according to  claim 2 , wherein X −  in general formula (b1) is an anion represented by general formula (1-1-12-1) shown below: 
       
         
           
           
               
               
           
         
       
     
     
         4 . A method of forming a resist pattern, comprising forming a resist film on a substrate using a resist composition according to  claim 1 , subjecting the resist film to exposure, and subjecting the resist film to alkali developing to form a resist pattern. 
     
     
         5 . A compound represented by general formula (b1) shown below: 
       
         
           
           
               
               
           
         
       
       wherein R 1  represents a hydrogen atom, a linear, branched or cyclic alkyl group of 1 to 10 carbon atoms or a heterocyclic group of 1 to 10 carbon atoms; R 2  represents a linear or branched alkyl group of 1 to 10 carbon atoms; x represents an integer of 0 to 6; n represents an integer of 0 to 3; and X −  represents an anion. 
     
     
         6 . The compound according to  claim 5 , wherein X −  in general formula (b1) is at least one anion selected from the group consisting of compounds represented by any one of general formulas (1) to (4) shown below: 
       
         
           
           
               
               
           
         
       
       wherein each X 0  independently represents a hydrocarbon group of 1 to 30 carbon atoms which may have a substituent; Q 1  represents a single bond or a divalent linking group containing a carbonyl group; each p independently represents an integer of 0 to 3; Q 2  represents a single bond or an alkylene group; X 10  represents a hydrocarbon group of 1 to 30 carbon atoms which may have a substituent; Q 3  represents a single bond or a divalent linking group; Y 10  represents —C(═O)— or —SO 2 —; Y 11  represents an alkyl group of 1 to 10 carbon atoms which may have a substituent or a fluorinated alkyl group of 1 to 10 carbon atoms which may have a substituent; Y 12  represents a cyclic alkyl group of 4 to 20 carbon atoms which may have an oxygen atom (═O) as a substituent; and q represents 0 or 1. 
     
     
         7 . An acid generator comprising the compound according to  claim 5 .