Plasma texturing reaction apparatus

Abstract

A plasma texturing reaction apparatus includes a chamber including a dielectric window and a chamber body and receiving a solar cell wafer to be textured, and a polygonal induction coil provided at an outer upper portion of the dielectric window to generate a magnetic field for generating plasma, a high frequency low power supply unit that supplies a cathode of the chamber with high frequency power corresponding to process conditions, and a high frequency source power supply unit that supplies the polygonal induction coil with high frequency power.

1 . A plasma texturing reaction apparatus comprising:
 a chamber including a dielectric window and a chamber body and receiving a solar cell wafer to be textured;   a polygonal induction coil provided at an outer upper portion of the dielectric window to generate a magnetic field for generating plasma;   a high frequency low power supply unit that supplies a cathode of the chamber with high frequency power corresponding to process conditions; and   a high frequency source power supply unit that supplies the polygonal induction coil with high frequency power.   
     
     
         2 . The plasma texturing reaction apparatus according to  claim 1 , wherein the polygon is at least a rectangle. 
     
     
         3 . The plasma texturing reaction apparatus according to  claim 1 , wherein the induction coil includes an induction coil having a radial structure. 
     
     
         4 . The plasma texturing reaction apparatus according to  claim 1 , wherein the induction coil includes an induction coil having a structure in which induction coils of a plurality of groups are connected in parallel to one another. 
     
     
         5 . The plasma texturing reaction apparatus according to  claim 1 , wherein the induction coil includes an induction coil having a batch type structure in which a plurality of induction coils are arranged in a matrix format to generate a magnetic field with respect to corresponding solar cell wafers. 
     
     
         6 . The plasma texturing reaction apparatus according to  claim 1 , wherein the induction coil includes an induction coil having a batch type structure in which a plurality of induction coils are arranged in a horizontal direction and a plurality of induction coils are arranged in a vertical direction below or above the plurality of induction coils arranged in the horizontal direction. 
     
     
         7 . The plasma texturing reaction apparatus according to  claim 1 , wherein the induction coil includes an induction coil having a structure in which at least one induction coil having a same shape or different shapes is sequentially provided inside a single induction coil. 
     
     
         8 . The plasma texturing reaction apparatus according to  claim 7 , wherein the single induction coil or the at least one induction coil provided inside the single induction coil includes a polygonal induction coil or a cylindrical induction coil. 
     
     
         9 . The plasma texturing reaction apparatus according to  claim 7  or  8 , wherein the single induction coil or the at least one induction coil provided inside the single induction coil independently adjusts high frequency power radiated under a control of a high frequency power distributor to allow ion density of a corresponding area to be uniformly adjusted at a desired degree. 
     
     
         10 . The plasma texturing reaction apparatus according to  claim 1 , wherein the high frequency low power supply unit includes a plurality of high frequency power generators and a plurality of high frequency matching sections to adjust intensity and density of ion energy and radical concentration. 
     
     
         11 . The plasma texturing reaction apparatus according to  claim 10 , wherein the plurality of high frequency power generators generate high frequency power with a same frequency or different frequencies.