Plasma processing apparatus and plasma processing method

Abstract

A plasma processing apparatus includes a processing vessel, a depressurizing part, a placing part, a discharge tube, an introduction waveguide, a gas-supplying part, a transport tube, and a first temperature-detecting part. The processing vessel is able to maintain an atmosphere. The depressurizing part reduces the internal pressure of the processing vessel. The placing part places an object to be processed. The discharge tube has a region generating plasma therein and being provided at a position separated from the processing vessel. The introduction waveguide causes microwave emitted from a microwave-generating part to propagate therethrough to introduce the microwave into the region generating the plasma. The gas-supplying part supplies a process gas to the region generating the plasma. The transport tube communicates the discharge tube with the processing vessel. The first temperature-detecting part detects temperature of the discharge tube.

1 . A plasma processing apparatus comprising:
 a processing vessel being able to maintain an atmosphere having a pressure reduced lower than the atmospheric pressure;   a depressurizing part reducing the internal pressure of the processing vessel to a specific pressure;   a placing part placing an object to be processed, provided in the processing vessel;   a discharge tube having a region generating plasma therein and being provided at a position separated from the processing vessel;   an introduction waveguide causing microwave emitted from a microwave-generating part to propagate therethrough to introduce the microwave into the region generating the plasma;   a gas-supplying part supplying a process gas to the region generating the plasma;   a transport tube communicating the discharge tube with the processing vessel; and   a first temperature-detecting part detecting temperature of the discharge tube.   
     
     
         2 . The apparatus according to  claim 1 , further comprising a first controlling part controlling temperature of the discharge tube by controlling the generation of the plasma based on a detection signal from the first temperature-detecting part. 
     
     
         3 . The apparatus according to  claim 2 , wherein the first controlling part executes the control of temperature of the discharge tube prior to the plasma processing for the object to be processed. 
     
     
         4 . A plasma processing apparatus comprising:
 a processing vessel having a region generating plasma therein and being able to maintain an atmosphere having a pressure reduced lower than the atmospheric pressure;   a depressurizing part reducing the internal pressure of the processing vessel to a specific pressure;   a placing part placing an object to be processed, provided in the processing vessel;   a plasma-generating part generating plasma by supplying an electromagnetic energy to the region generating the plasma;   a gas-supplying part supplying a process gas to the region generating the plasma; and   a second temperature-detecting part detecting temperature of a member provided at a position facing the region generating the plasma.   
     
     
         5 . The apparatus according to  claim 4 , further comprising a second controlling part controlling temperature of the member by controlling the generation of the plasma based on a detection signal from the second temperature-detecting part. 
     
     
         6 . The apparatus according to  claim 5 , wherein the second controlling part executes the control of temperature of the member prior to the plasma processing for the object to be processed. 
     
     
         7 . A plasma processing method including:
 generating plasma in an atmosphere having a pressure reduced lower than the atmospheric pressure; producing a plasma product by exciting a process gas supplied to the plasma; and performing plasma processing on an object to be processed through the use of the plasma product, the method comprising:   a first processing process of controlling temperature of a member by controlling the generation of plasma based on the temperature of the member provided at a position facing a region generating plasma; and a second processing process performing the plasma processing on the object to be processed through the use of the plasma product.   
     
     
         8 . The method according to  claim 7 , wherein the member is a discharge tube having a region generating plasma therein.