Apparatus for producing trichlorosilane and method for producing trichlorosilane

Abstract

An apparatus for producing tichlorosilane includes: a decomposing furnace, a heating unit heating the inside of the decomposing furnace, a raw material supplying tube for guiding polymer and hydrogen chloride to be guided to the inner bottom portion of the decomposing furnace, and a gas discharge tube for discharging reaction gas from the top of the reaction chamber provided between the outer peripheral surface of the raw material supplying tube and the inner peripheral surface of the decomposing furnace, a fin, which guides a fluid mixture of the polymer and the hydrogen chloride supplied from the lower end opening of the raw material supplying tube to be agitated and rise upward in the reaction chamber, and is formed integrally with at least one of the outer peripheral surface of the raw material supplying tube and the inner peripheral surface of the decomposing furnace.

1 - 6 . (canceled) 
     
     
         7 . A method for producing trichlorosilane of introducing into a decomposing furnace hydrogen chloride and polymer containing high boiling point chlorosilanes produced in a polycrystalline silicon producing process, in a trichlorosilane producing or in a converting process, and reacting them with each other at high temperature such that the polymer decomposes, thereby producing trichlorosilane, the method for producing trichlorosilane comprising:
 heating the decomposing furnace and supplying the polymer and the hydrogen chloride from the top of the heated decomposing furnace to be guided to the inner bottom portion of the decomposing furnace while being gasified due to the preheating; and   agitating a fluid mixture of the polymer and the hydrogen chloride and reacting them with each other while rising upward from the inner bottom portion in the decomposing furnace.   
     
     
         8 . The method for producing trichlorosilane of  claim 7 , wherein the polymer and the hydrogen chloride become the fluid mixture while being guided to the inner bottom portion of the decomposing furnace. 
     
     
         9 . The method for producing trichlorosilane of  claim 7 , wherein most of the fluid mixture is evaporated and gasified and the fluid mixture is introduced into the inner bottom portion in the decomposing furnace. 
     
     
         10 . The method for producing trichlorosilane of  claim 7 , wherein the reaction of the polymer and the hydrogen chloride results in a produced gas containing trichlorosilane which is introduced into a fluidized chloroination furnace. 
     
     
         11 . The method for producing trichlorosilane of  claim 7 , wherein the reaction of the polymer and the hydrogen chloride results in a produced gas which contains trichlorosilane which is condensed so that a condensate of trichlorosilane is introduced into a distillation column. 
     
     
         12 . The method for producing trichlorosilane of  claim 7 , wherein the quantity ratio of the hydrogen chloride to the polymer is 10% to 30% by mass of the hydrogen chloride to a total amount of the polymer. 
     
     
         13 . The method for producing trichlorosilane of  claim 7 , wherein a temperature in the decomposition furnace is equal or higher than 450° C. and equal to or lower than 700° C. 
     
     
         14 . The method for producing trichlorosilane of  claim 7 , further comprising the step of injecting pressurized inert gas into the decomposition furnace to crush any deposits of silicon oxide in the decomposition furnace. 
     
     
         15 . The method for producing trichlorosilane of  claim 7 , further comprising the step of cleaning the decomposition furnace by alternatively injecting pressurized inert gas into the decomposition furnace to crush deposited material into dust and discharging the inert gas and the dust from the decomposition furnace.