Single particle film etching mask and production method of single particle film etching mask, production method of micro structure with use of single particle film etching mask and micro structure produced by micro structure production method

Abstract

A micro structure which is preferred as an original plate of an antireflection, a mold of nano imprint or injection molding is obtained by a single particle film etching mask on which each particle is precisely aligned and closest packed in two dimensions. A single particle film etching mask is produced by a drip step wherein a dispersed liquid in which particles dispersed in a solvent are dripped onto a liquid surface of a water tank, a single particle film formation step in which a single particle film which consists of the particles by volatizing a solvent is formed, and a transfer step in which the single particle film is transferred to a substrate. The single particle film etching mask on which particles are closest packed in two dimensions, has a misalignment D(%) of an array of the particles that is defined by D(%)=|B−A|×100/A being less than or equal to 10%. However, A is the average diameter of the particles, and B is the average pitch between the particles in the single particle film.

1 . A single particle film etching mask comprising:
 a single particle film on which each particle is precisely aligned and closest packed in two dimensions, and a misalignment D(%) of an array of particles which is defined in the following equation (1) is less than or equal to 10%,
     D (%)=| B−A|× 100/ A   (1)
 
   wherein, A is the average diameter of the particles, B is the average pitch between particles in the single particle film in the equation (1).   
     
     
         2 . A micro structure, produced by a gas phase etching with the use of the single particle film etching mask as claimed in  claim 1 , wherein a misalignment D′(%) of an array of the structure defined in the following equation (2) is less than or equal to 10%,
     D′ (%)=| C−A|× 100/ A   (2)
 
 wherein, A is the average diameter of the particles, C is the average pitch of the structural array in the microstructure in the equation (2). 
 
     
     
         3 . A nano imprint mold or a mold for injection molding produced by electroforming with the use of the micro structure as claimed in  claim 2 , wherein a misalignment D″(%) of an array of the structure which is defined in the following equation (3) is less than or equal to 10%,
     D″ (%)=| E−A|× 100/ A   (3)
 
 wherein, A is the average diameter of the particles, E is the average pitch of the structural array in the nano imprint or the injection molding in the equation 3. 
 
     
     
         4 . A nano imprint product or an injection molding product produced by a nano imprint method or a mold for injection molding method with the use of the mold as claimed in  claim 3 , wherein a misalignment D″′(%) of array of the structure which is defined in the following equation (4) is less than or equal to 10%,
     D′″ (%)=| F−A|× 100/ A   (4)
 
 wherein, A is the an average diameter of the particles, F is the an average pitch of the structural array in the nano imprint or the injection molding in the equation 4.