Method and apparatus for patterning a disk

Abstract

An apparatus to carry out patterning of a disk includes a rotatable mask having a cone shape and a nanopattern on an exterior surface of said mask and a radiation source configured to supply radiation of a wavelength of 436 nm or less from said nanopattern, while said nanopattern is in contact with a radiation-sensitive layer of material. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

1 . An apparatus to carry out patterning of a disk, comprising:
 a) a rotatable mask having a cone shape and a nanopattern on an exterior surface of said mask; and   b) a radiation source configured to supply radiation of a wavelength of 436 nm or less from said nanopattern, while said nanopattern is in contact with a radiation-sensitive layer of material.   
     
     
         2 . An apparatus in accordance with  claim 1 , wherein said rotatable mask is transparent. 
     
     
         3 . An apparatus in accordance with  claim 2 , wherein said rotatable mask is a phase-shifting mask. 
     
     
         4 . An apparatus in accordance with  claim 3 , wherein said phase-shifting mask is made of elastomeric material. 
     
     
         5 . An apparatus in accordance with  claim 1 , wherein said rotatable mask is configured to employ radiation generated using surface plasmon techniques. 
     
     
         6 . An apparatus in accordance with  claim 5 , wherein a surface of said mask comprises a metal layer including nanoholes. 
     
     
         7 . An apparatus in accordance with  claim 1 , wherein multiple cones are present, and wherein a cone is present on both the top side and bottom side of a disk which is imaged by said apparatus. 
     
     
         8 . An apparatus in accordance with  claim 1 , wherein said rotatable mask is suspended over said disk by a tensioning device which can be adjusted to control an amount of force applied to a surface in contact with said rotatable mask.