Method for the manufacture of a reflective layer system for back surface mirrors

Abstract

In method for the manufacture of a reflective layer system on a substrate with at least one metallic reflective layer, a dielectric, transparent layer is deposited on the substrate as a silicon oxide containing layer using a suitable PVD process. The coated substrate subsequently is transferred out of the vacuum and at least one metallic reflective layer is deposited via a wet-chemical process.

1 . Method for manufacture of a reflective layer system for a back surface mirror on a substrate comprising at least one transparent, dielectric layer and at least one metallic reflective layer, comprising:
 deposition of a dielectric, transparent layer containing silicon oxide on a surface of a substrate by physical vapor deposition in a vacuum to provide a coated substrate;   subsequent transfer of the coated substrate out of the vacuum, and   deposition of at least one metallic reflective layer upon the dielectric, transparent layer of the coated substrate using a wet-chemical process.   
     
     
         2 . Method for the manufacture of a reflective layer system according to  claim 1 , wherein a surface of the layer containing silicon oxide, following the transfer of the coated substrate and prior to the deposition of the at least one reflective layer, is chemically activated. 
     
     
         3 . Method for the manufacture of a reflective layer system according to  claim 1 , wherein the layer containing silicon oxide, prior to the transfer of the substrate is coated with an adhesive-promoting layer with a thickness of less than 5 nm using a PVD process. 
     
     
         4 . Method for the manufacture of a reflective layer system according to  claim 1 , wherein the surface of the substrate is pre-treated and then coated using plasma treatment and/or tempering in a vacuum. 
     
     
         5 . Method for the manufacture of a reflective layer system according to  claim 1 , wherein the surface of the substrate is pre-treated and then coated using deposition of an adhesive-promoting layer with a thickness in a range of less than 5 nm. 
     
     
         6 . Method for the manufacture of a reflective layer system according to  claim 1 , wherein an alternating layer system is deposited on the substrate using physical vapor deposition, which comprises at least one series of layers with one dielectric layer having a high refractive index and one dielectric layer having a low refractive index, wherein the silicon oxide containing layer comprises the one dielectric layer having a low refractive index and finishes the side of the alternating layer system facing away from the substrate. 
     
     
         7 . Method for the manufacture of a reflective layer system according to  claim 1 , wherein following deposition of the at least one reflective layer, a metallic, reflective functional layer is deposited in a wet-chemical process on the at least one reflective layer.