Plasma Processing Apparatus

Abstract

A plasma processing apparatus includes a processing chamber, a sample stage, a radio-frequency power supply which enables generation of plasma in the processing chamber, and at least one induction coil. The induction coil is formed by connecting a plurality of identical coil elements so that a same radio-frequency voltage is applied to each of the plurality of identical coil elements, and each input terminals of the identical coil elements is displaced at intervals of an angle calculated by dividing 360° by the number of identical coil elements. Continuous conductor portions of the identical coil elements are formed on different adjacent surfaces of the annular ring and constituted so as to be displaced from one another for a predetermined angle at a time so as to extend along a circumferential direction of the different adjacent surfaces of the annular ring.

1 . A plasma processing apparatus comprising:
 a processing chamber which subjects an object to plasma processing;   an introducer which introduces a gas for plasma processing into the processing chamber;   an evacuator which evacuates an interior of the processing chamber;   a sample stage which mounts of the object;   a radio-frequency power supply which enables generation of plasma in the processing chamber; and   at least one induction coil connected to the radio-frequency power supply;   wherein the induction coil is formed by connecting a plurality of identical coil elements in a parallel circuit-like arrangement so that a same radio-frequency voltage is applied to each of the plurality of identical coil elements;   wherein each input terminals of the identical coil elements is displaced at intervals of an angle calculated by dividing 360° by the number of identical coil elements; and   wherein continuous conductor portions of the identical coil elements are formed on different adjacent surfaces of the annular ring and constituted so as to be displaced from one another for a predetermined angle at a time so as to extend along a circumferential direction of the different adjacent surfaces of the annular ring, by which the conductor portions of the coil elements are disposed so as to be displaced at a time from one surface of the annular ring to another surface adjacent thereto while extending in the circumferential direction.   
     
     
         2 . The plasma processing apparatus according to  claim 1 , wherein the annular ring is an insulating member. 
     
     
         3 . The plasma processing apparatus according to  claim 1 , wherein the annular ring is an insulating member, conductor portions of the identical coil elements are formed on a surface of the insulating member, and a refrigerant passage for cooling is formed to the insulating member. 
     
     
         4 . The plasma processing apparatus according to  claim 1 , wherein the annular ring is an insulating member, a cross-sectional shape of the annular ring is polygonal, and the continuous conductor portions of the identical coil elements are formed so as to extend in the circumferential direction on adjacent surfaces of the annular ring having the polygonal cross sectional shape. 
     
     
         5 . The plasma processing apparatus according to  claim 1 , wherein the annular ring is a virtual annular ring, and conductor portions of the identical coil elements are respectively formed along a surface of the virtual annular ring. 
     
     
         6 . The plasma processing apparatus according to  claim 1 , wherein the identical coil elements are respectively arranged three-dimensionally in a radial direction and a height direction of the annular ring.