Apparatus for treating thin film layers during photovoltaic module manufacture

Abstract

Systems and processes for treatment of a cadmium telluride thin film photovoltaic device are generally provided. The systems can include a treatment system and a conveyor system. The treatment system includes a preheating section, a treatment chamber, and an anneal oven that are integrally interconnected within the treatment system. The conveyor system is operably disposed within the treatment system and configured for transporting substrates in a serial arrangement into and through the preheat section, into and through the treatment chamber, and into and through the anneal oven at a controlled speed. The treatment chamber is configured for applying a material to a thin film on a surface of the substrate and the anneal oven is configured to heat the substrate to an annealing temperature as the substrates are continuously conveyed by the conveyor system through the treatment chamber.

1 . An apparatus for treatment of a cadmium telluride thin film photovoltaic device, the apparatus comprising:
 a treatment system comprising a preheating section, a treatment chamber, and an anneal oven, wherein the preheating section, the treatment chamber, and the anneal oven are integrally interconnected within the treatment system; and,   a conveyor system operably disposed within the treatment system and configured for transporting substrates in a serial arrangement into and through the preheat section, into and through the treatment chamber, and into and through the anneal oven at a controlled speed,   wherein the treatment chamber is configured for applying a material to a thin film on the substrate and the anneal oven is configured to heat the substrate to an annealing temperature as the substrates are continuously conveyed by the conveyor system through the treatment chamber.   
     
     
         2 . The apparatus as in  claim 1 , wherein the treatment chamber comprises a spray head configured to spray a liquid onto the surface of the substrate. 
     
     
         3 . The apparatus as in  claim 2 , further comprising a source tank connected to the spray head and configured to provide a continuous stream of the liquid to the spray head. 
     
     
         4 . The apparatus as in  claim 1 , wherein the treatment chamber comprises an applicator roll configured to apply a liquid to the surface of the substrate. 
     
     
         5 . The apparatus as in  claim 1 , wherein the conveyor system comprises a single conveyor belt that traverses through the treatment chamber. 
     
     
         6 . The apparatus as in  claim 5 , wherein the conveyor system further comprises a cleaning system configured to clean the single conveyor belt. 
     
     
         7 . The apparatus as in  claim 6 , wherein the cleaning system comprises a cleaning tank positioned such that the single conveyor belt passes through the cleaning tank on a return path. 
     
     
         8 . The apparatus as in  claim 1 , wherein the treatment chamber comprises a plurality of interconnected modular units, with each of the modular units having an independent conveyor. 
     
     
         9 . The apparatus as in  claim 8 , wherein each of the modular units are independently controlled so that the substrates are conveyed through the treatment chamber at a desired preheating rate, deposition rate, and anneal rate. 
     
     
         10 . The apparatus as in  claim 8 , wherein the anneal section comprises a plurality of modular units. 
     
     
         11 . The apparatus as in  claim 8 , wherein the treatment chamber is defined within an individual module and the independent conveyor comprises a conveyor belt and a cleaning system configured to clean the conveyor belt. 
     
     
         12 . The apparatus as in  claim 1 , wherein the treatment chamber further comprises a cooling chamber, wherein the preheating section, the treatment chamber, the anneal oven, and the cooling chamber are integrated within the treatment chamber. 
     
     
         13 . The apparatus as in  claim 1 , wherein each of the preheating section, the treatment chamber, and the anneal oven are separated by a wall defining a slit entry sized to receive the substrates therethrough.